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KOH etching equipment ETC-8001F-ETC-8001F
KOH etching equipment ETC-8001F-Epiquest Co., Ltd.

KOH etching equipment ETC-8001F
Epiquest Co., Ltd.


About This Product

We perform etching processing using molten KOH on SiC wafers, GaN wafers, etc. safely and precisely. Just set the wafer in the substrate basket and press the button to start etching.

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    KOH etching equipment ETC-8001F

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1 Models of KOH etching equipment ETC-8001F

Image Part Number Price (excluding tax) Crucible size Shutter mechanism for crucible lid Board cage up and down mechanism Substrate basket rotation mechanism Compatible wafer size Exhaust duct diameter Maximum heating temperature (control thermocouple value) Thermocouple up and down mechanism for measuring liquid temperature Temperature stability (control thermocouple value) Device size (housing) Equipment weight Electric power Option
KOH etching equipment ETC-8001F-Part Number-ETC-8001F

ETC-8001F

Available upon quote

Φ250×H190 (t2)

Manual (mechanically opens and closes the crucible lid)

Automatic

Motor drive (Max.10rpm)

8 inches

Φ100 *Please prepare exhaust equipment for exhaust inside the housing.

700℃

Manual (move from machine position to liquid temperature measurement position)

±1℃

W1000×D930×H2,200

350kg

Single phase 200V 30A

Signal tower

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