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  3. Semiconductor Lithography Equipment
  4. Exposure device Semi-auto aligner MA-4000 (Ryokosha Co., Ltd.)
Exposure device Semi-auto aligner MA-4000-MA-4000
Exposure device Semi-auto aligner MA-4000-Ryokosha Co., Ltd.

Exposure device Semi-auto aligner MA-4000
Ryokosha Co., Ltd.

Ryokosha Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

31.3hours

Relatively Fast Response

About This Product

■Features

・All functions are compactly integrated ・Achieved 20% increase in takt time compared to our standard machine ・Two types of alignment methods can be selected depending on the application. ・Proximity gap between mask and wafer can be set with high precision using unique parallel alignment mechanism ・Supports 6-inch wafers ・Achieves high-speed, high-precision, and stable automatic transfer using the vacuum suction method on the backside of the wafer.

  • Product

    Exposure device Semi-auto aligner MA-4000

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1 Models of Exposure device Semi-auto aligner MA-4000

Image Part Number Price (excluding tax)
Exposure device Semi-auto aligner MA-4000-Part Number-MA-4000

MA-4000

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About Company Handling This Product

Ryokosha Co., Ltd.

Response Rate

100.0%

Response Time

31.3hrs

Related search keywords

Semiconductor Lithography Equipment
Semiconductor Lithography Equipment　Ryokosha Co., Ltd.
Ryokosha Co., Ltd.

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