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Maskless exposure equipment Minimal Maskless exposure equipment-Minimal maskless exposure equipment
Maskless exposure equipment Minimal Maskless exposure equipment-PMT Co., Ltd.

Maskless exposure equipment Minimal Maskless exposure equipment
PMT Co., Ltd.


About This Product

Minimal maskless exposure equipment uses a display element called a DMD (Digital Micromirror Device) to draw patterns directly onto the wafer through ON/OFF control that is fully synchronized with the stage. Power consumption and installation space are significantly reduced by using an LED light source, compact housing, and minimal design that does not require a clean room. In addition, we have fully automated focusing and alignment, making it as easy as just pressing the start button.

■Direct drawing with DMD

A DMD is a display element that consists of tiny mirrors 10-plus µm square arranged in a grid pattern. By illuminating the mirror surface with light from an LED light source and tilting each mirror one by one (ON/OFF control), binarized pattern image data is drawn directly on the board. Since the cost and time required for photomask production are eliminated, prototyping of semiconductor devices can be made more efficiently.

■Equipped with fine mode to improve jaggies

In addition to the standard exposure mode, a fine exposure mode that uses pixel interpolation technology is included as standard to improve jaggies in exposure results. Although it will take longer to complete, the smoothness of diagonal lines and curves will be dramatically improved. It can be used depending on the tact and accuracy and purpose.

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    Maskless exposure equipment Minimal Maskless exposure equipment

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1 Models of Maskless exposure equipment Minimal Maskless exposure equipment

Image Part Number Price (excluding tax) Exposure method Exposure resolution Weight Overlay accuracy Focusing alignment Power consumption Body dimensions Board transportation Substrate Light source Utility Data resolution
Maskless exposure equipment Minimal Maskless exposure equipment-Part Number-Minimal maskless exposure equipment

Minimal maskless exposure equipment

Available upon quote

Scan exposure method

1.0µm (1:1 L/S)

Approximately 150kg

Within ±0.5μm

Fully automatic

300W

W294 × D450 × H1,440mm

Minimal Shuttle & Conveyance System (PLAD)

0.5 inch minimal wafer

LED (light source wavelength: λ=385nm)

AC100V (5A) Compressed air 0.45~0.8MPa

Standard exposure: 0.5µm/pix, Fine exposure: 0.05µm/pix (x10), 0.10µm/pix (x5), 0.125µm/pix (x4), 0.25µm/pix (x5)

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