Spectroscopic film thickness measurement TFW-100 (1)
Lambda Vision Co., Ltd.
About This Product
This is a low-cost spectroscopic film thickness measuring device for the industrial field. Since it is non-contact and non-destructive, measurements can be made quickly and easily without damaging the sample. It is widely used for film thickness measurement in research and development and in-line quality control. We have achieved high precision and high stability at a low price.
■Features
- Film thickness can be measured non-contact and non-destructively.
・Supports film thickness measurement of up to 3 layers with a thickness of 10nm to 1,000μm.
・Can measure not only film thickness but also optical multiplier (n, k). (Total number of parameters up to 3)
- Also compatible with minute spots.
- Color filter pigment film thickness can also be measured.
-
Product
Spectroscopic film thickness measurement TFW-100 (1)
-
Handling Company
Lambda Vision Co., Ltd.
-
Categories
1 Models of Spectroscopic film thickness measurement TFW-100 (1)
| Product Image | Part Number | Price (excluding tax) | Light source | Measured film thickness | Measurement reproducibility | Measurement software | Measurement wavelength | Purpose |
|---|---|---|---|---|---|---|---|---|
|
|
TFW-100 (1) |
Available upon quote | 12V-100W Halogen | 10nm~500nm (C/F), 500nm~15μm (FFT) | 0.2%~1% (depending on membrane quality) | TF-Lab (Curve fitting method / FFT method) | 300nm~1,000nm | For thin films such as ITO |
Customers who viewed this product also viewed
Other products of Lambda Vision Co., Ltd.
View more products of Lambda Vision Co., Ltd.
About Company Handling This Product
- Japan