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Spectroscopic film thickness measurement TFW-100 (1)-TFW-100 (1)
Spectroscopic film thickness measurement TFW-100 (1)-Lambda Vision Co., Ltd.

Spectroscopic film thickness measurement TFW-100 (1)
Lambda Vision Co., Ltd.

Lambda Vision Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

40.8hours


About This Product

This is a low-cost spectroscopic film thickness measuring device for the industrial field. Since it is non-contact and non-destructive, measurements can be made quickly and easily without damaging the sample. It is widely used for film thickness measurement in research and development and in-line quality control. We have achieved high precision and high stability at a low price.

■Features

- Film thickness can be measured non-contact and non-destructively. ・Supports film thickness measurement of up to 3 layers with a thickness of 10nm to 1,000μm. ・Can measure not only film thickness but also optical multiplier (n, k). (Total number of parameters up to 3) - Also compatible with minute spots. - Color filter pigment film thickness can also be measured.

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    Spectroscopic film thickness measurement TFW-100 (1)

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1 Models of Spectroscopic film thickness measurement TFW-100 (1)

Image Part Number Price (excluding tax) Measured film thickness Measurement wavelength Measurement reproducibility Measurement software Purpose Light source
Spectroscopic film thickness measurement TFW-100 (1)-Part Number-TFW-100 (1)

TFW-100 (1)

Available upon quote

10nm~500nm (C/F), 500nm~15μm (FFT)

300nm~1,000nm

0.2%~1% (depending on membrane quality)

TF-Lab (Curve fitting method / FFT method)

For thin films such as ITO

12V-100W Halogen

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About Company Handling This Product

Response Rate

100.0%


Response Time

40.8hrs

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