HF-CVD equipment for diamond synthesis HFCVD series
Arios Co., Ltd.
About This Product
■Summary
This device is a hot filament type CVD device for full-scale diamond synthesis. By selecting various options in addition to the basic system, we can meet a wide range of needs. Homoepitaxial and heteroepitaxial growth of diamond is possible.
Microwave plasma products such as the DCVD151 series, a CVD device for single-crystal diamond synthesis that allows high-purity diamond synthesis experiments, and the DCVD301B/601B, a CVD device for diamond synthesis that achieves large area and high-speed growth for production purposes. We also have a lineup of CVD equipment.
■Features
・High-speed growth is possible with the patented two-layer filament structure and our unique heating control method.
・Water-cooled chamber and electrodes allow long-term operation
・Achieve stable processes with our unique automatic pressure controller (APC)
・Equipped with a radiation thermometer as standard to accurately measure board temperature
・Equipped with a touch panel LCD monitor, allowing automatic recipe operation
■Options
・Gas system added (up to 7 systems)
・Automatic control (recipe operation)
・Increased filament heating power
・Substrate heating mechanism
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Product
HF-CVD equipment for diamond synthesis HFCVD series
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Handling Company
Arios Co., Ltd.
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Categories
1 Models of HF-CVD equipment for diamond synthesis HFCVD series
| Product Image | Part Number | Price (excluding tax) | Board size (maximum) | Chamber configuration | Chamber material/shape | Control method | Exhaust system | Filament heating power | Gas supply system | Leak amount | Main body stand | Movement rotation mechanism | Pressure adjustment | Sample holder size | Substrate cooling method | Temperature measurement | Ultimate vacuum | Utility Process gas | Utility compressed air | Utility power | Vacuum gauge |
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HFCVD-6FHA |
Available upon quote | Φ3 inch x 1 piece | 1 chamber | SUS horizontal chamber | Touch panel (manual) | Turbo molecular pump + dry pump | 0~1.6kW continuously variable (constant current mode, constant power mode) ×2 | MFC2 lines (H2, CH4), maximum 7 lines | 1.0×10^-8Pa・m^3/s or less (excluding O-ring transmission) | With casters and adjusters (including power supply), weight approximately 200kg |
Substrate rotation mechanism (motor type: variable rotation speed 0~30rpm) Bellows type vertical movement mechanism (stroke 50mm) |
Automatic pressure controller (APC) | Φ80mm | Water cooling | Radiation thermometer (one each for filament and substrate) | 5×10^-4Pa or less | H2, CH4 (1/4" Swagelok or 1/4" VCR) | 0.5MPa | [Body] AC200V three-phase 40A, [Chiller] AC200V single-phase 15A | Full range vacuum gauge + diaphragm vacuum gauge (for APC) |
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About Company Handling This Product
- Japan