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History
Response Rate
100.0%
Response Time
1.7hours
Very Fast Response
Product
HF-CVD equipment for diamond synthesis HFCVD seriesHandling Company
Arios Co., Ltd.Categories
| Image | Part Number | Price (excluding tax) | Sample holder size | Movement rotation mechanism | Vacuum gauge | Utility power | Utility compressed air | Utility Process gas | Temperature measurement | Main body stand | Exhaust system | Substrate cooling method | Board size (maximum) | Pressure adjustment | Control method | Ultimate vacuum | Leak amount | Filament heating power | Chamber configuration | Chamber material/shape | Gas supply system |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
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HFCVD-6FHA |
Available upon quote |
Φ80mm |
Substrate rotation mechanism (motor type: variable rotation speed 0~30rpm) |
Full range vacuum gauge + diaphragm vacuum gauge (for APC) |
[Body] AC200V three-phase 40A, [Chiller] AC200V single-phase 15A |
0.5MPa |
H2, CH4 (1/4" Swagelok or 1/4" VCR) |
Radiation thermometer (one each for filament and substrate) |
With casters and adjusters (including power supply), weight approximately 200kg |
Turbo molecular pump + dry pump |
Water cooling |
Φ3 inch x 1 piece |
Automatic pressure controller (APC) |
Touch panel (manual) |
5×10^-4Pa or less |
1.0×10^-8Pa・m^3/s or less (excluding O-ring transmission) |
0~1.6kW continuously variable (constant current mode, constant power mode) ×2 |
1 chamber |
SUS horizontal chamber |
MFC2 lines (H2, CH4), maximum 7 lines |
Reviews shown here are reviews of companies.
Reviews shown here are reviews of companies.
Response Rate
100.0%
Response Time
1.7hrs
