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  4. Nanopattern exposure equipment PhableR 100 (Kyodo International, Inc.)
Nanopattern exposure equipment PhableR 100-PhableR 100
Nanopattern exposure equipment PhableR 100-Kyodo International, Inc.

Nanopattern exposure equipment PhableR 100
Kyodo International, Inc.

About This Product

The PhableR100 is a special device that uses the Talbot effect to expose periodic structures at a fine, single-shot exposure with a half pitch of 150 nm. It is now possible to introduce it at a reasonable price to customers who are developing devices with periodicity at the resolution of electron beam lithography. When selecting a DUV light source, half-pitch 75nm batch exposure is achieved.

■What is nanopatterning technology?

A nanometer is a unit of length equal to 10-9 meters (m) = one billionth of a meter. Current electronic devices use technology in the nanometer range, and the term nanotechnology has come to be commonly used in the semiconductor industry. Several methods have been put into practical use for pattern processing in the nanometer region, such as electron beam, lithography, nanoimprint, and self-assembly, but positional accuracy, There are various issues such as reproducibility, cost, and processing time.

■PhableR 100 achieves high resolution below 300nm pitch

PhableR 100 is a system based on EULITHA's proprietary exposure technology PHABLE (short for Photonics Enabler), which enables non-contact proximity exposure of high-resolution periodic structures. PhablerR 100 provides essentially the same resolution as a DUV projection exposure system without the complex and expensive optics and mechanical structures. ・While general mask aligners have a resolution of only 1-2um, it is possible to create linear gratings with a half pitch of 150nm with high uniformity. - Linear or curved gratings and hexagonal/square symmetric 2D photonic crystal patterns can be transferred with a period of 300 nm or less. ・Full exposure ・The mask and substrate are manually set into the device, and the exposure process is controlled by the on-board computer.

■Non-contact protects the mask from damage and contamination

It can also be used as a regular mask aligner in proximity or contact mode, and even micron-scale structures can be transferred.

  • Product

    Nanopattern exposure equipment PhableR 100

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1 Models of Nanopattern exposure equipment PhableR 100

Image Part Number Price (excluding tax) Resolution Illuminance uniformity Board size Resist thickness Mask format Pitch range Control Operation
Nanopattern exposure equipment PhableR 100-Part Number-PhableR 100

PhableR 100

Available upon quote

150nm half pitch (linear grating) 75nm half pitch (linear grating) when selecting DUV light source

＜3%

~φ100mm

Approximately 1µm

5

300nm~3µm (150nm~ when DUV light source is selected)

Touch panel

Manual loading – automatic exposure

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About Company Handling This Product

Kyodo International, Inc.

Company Overview

Kyodo International, Inc. established in 1970 and based in Kawasaki-shi, Japan, is a manufacturer and distribu...

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  • Japan

Related search keywords

Semiconductor Lithography Equipment
Semiconductor Lithography Equipment　Kyodo International, Inc.
Kyodo International, Inc.

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