Kitano Seiki Co., Ltd.'s Sputtering Equipment

■Summary This sputter source is a general-purpose compact magnetron sputter source that is compatible with ultra-high vacuum. Since the main body i...

• Machining / Machine Tools

• Sputtering Equipment

■Summary EBV40A1 is a device developed for producing films of several atomic layers or as a dopant for multilayer films produced using MBE equipmen...

• Machining / Machine Tools

• Sputtering Equipment

■Summary The ES40C1 electron gun is a scanning electron gun developed for Auger electron spectroscopy. By using an Einzel lens, a large beam curren...

• Machining / Machine Tools

• Sputtering Equipment

■Summary FS40A1 was developed as an antistatic electron gun for use in XPS, UPS, and SIMS. Designed with simplicity, ease, and reliability in mind....

• Machining / Machine Tools

• Sputtering Equipment

■Summary The 40C1 ion gun is a compact and simple ion gun for cleaning sample surfaces. The mounting flange is DN40CF (outer diameter 70mm) and can...

• Machining / Machine Tools

• Sputtering Equipment

■Summary The 40E1 ion gun is a convergent ion gun that uses a two-stage exit lens. The spot size and accelerating voltage (0.15eV to 5keV) can be e...

• Machining / Machine Tools

• Sputtering Equipment

■Summary The RS40B1 is a new, high power twin anode (Al/Mg) X-ray source developed for photoelectron spectroscopy. Z-shift is also available as an ...

• Machining / Machine Tools

• Sputtering Equipment

■Summary UVS40A2 is an ultraviolet generator that is compatible with various gases (helium, neon, krypton, argon, hydrogen). The discharge of the U...

• Machining / Machine Tools

• Sputtering Equipment