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  4. M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.'s Semiconductor Manufacturing Equipment Component & Part Machining

M.WATANABE & CO.,LTD.

12 products found

Semiconductor manufacturing equipment High performance single wafer atmospheric pressure CVD (APCVD) equipment (A200V)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High performance single wafer atmospheric pressure CVD (APCVD) equipment (A200V)

190+ people viewing

Last viewed: 3 hours ago

Response Rate
100.0 %
Response Time
40.9 hours

Single-wafer atmospheric pressure CVD (APCVD) equipment for forming NSG (SiO2) /PSG/BPSG films for small quantities and a wide variety of products ...


Semiconductor manufacturing equipment Continuous normal pressure CVD equipment for mass production of solar cells (AMAX1000S)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Continuous normal pressure CVD equipment for mass production of solar cells (AMAX1000S)

150+ people viewing

Last viewed: 8 seconds ago

Response Rate
100.0 %
Response Time
40.9 hours

High productivity continuous atmospheric pressure CVD (APCVD) equipment for mass production of crystalline Si solar cells NSG (SiO2) /PSG/BSG film ...


Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)

190+ people viewing

Last viewed: 4 hours ago

Response Rate
100.0 %
Response Time
40.9 hours

High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible wit...


Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX800V)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX800V)

190+ people viewing

Response Rate
100.0 %
Response Time
40.9 hours

High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible wit...


Silicon wafer manufacturing related Short delivery time and small lot production possible Carrier for silicon wafer polishing-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Silicon wafer manufacturing related Short delivery time and small lot production possible Carrier for silicon wafer polishing

140+ people viewing

Response Rate
100.0 %
Response Time
40.9 hours

We manufacture carriers that are used as wafer holders in the wrapping and polishing processes of silicon wafer manufacturing to meet customer need...


Higher gas displacement characteristics In-line gas filter CEPURE-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Higher gas displacement characteristics In-line gas filter CEPURE

140+ people viewing

Response Rate
100.0 %
Response Time
40.9 hours

In addition to the design that reduces pressure loss, it also has excellent characteristics required for gas filters, such as filtration characteri...


Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)

210+ people viewing

Response Rate
100.0 %
Response Time
40.9 hours

Batch type (simultaneous processing of multiple sheets) APCVD equipment for NSG (SiO2) /BSG/PSG/BPSG film formation for prototyping, development, a...


Semiconductor manufacturing equipment Low-temperature film deposition Compatible with flexible substrates Glass substrate film deposition equipment-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Low-temperature film deposition Compatible with flexible substrates Glass substrate film deposition equipment

130+ people viewing

Last viewed: 1 day ago

Response Rate
100.0 %
Response Time
40.9 hours

This is a 4.5 generation glass substrate deposition system compatible with rigid/flexible devices such as FPDs. ■Basic information Equipped with t...


Semiconductor manufacturing equipment Contributes to the reduction of chemicals and pure water Quartz tube cleaning equipment (HTC/VTC series)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Contributes to the reduction of chemicals and pure water Quartz tube cleaning equipment (HTC/VTC series)

160+ people viewing

Last viewed: 7 hours ago

Response Rate
100.0 %
Response Time
40.9 hours

Vertical cleaning equipment (VTC series) saves space and contributes to "reducing the use of chemical solutions and pure water." World-class delive...


Semiconductor manufacturing equipment IPA steam drying equipment-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment IPA steam drying equipment

160+ people viewing

Last viewed: 20 hours ago

Response Rate
100.0 %
Response Time
40.9 hours

Displaces moisture with IPA steam and dries the target object. For 4 to 8 inch wafers. Can be installed and docked in various cleaning machines. T...


Semiconductor manufacturing equipment Pitch conversion Face to Face transfer Wafer transfer and transfer equipment-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Pitch conversion Face to Face transfer Wafer transfer and transfer equipment

130+ people viewing

Response Rate
100.0 %
Response Time
40.9 hours

Functions such as automatic transfer of wafers in a cassette to a different cassette, simultaneous transfer of two cassettes, pitch conversion, and...


Semiconductor manufacturing equipment Compatible with high-definition photomasks Photomask cleaning equipment Spin type cleaning equipment WULF series-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Compatible with high-definition photomasks Photomask cleaning equipment Spin type cleaning equipment WULF series

120+ people viewing

Last viewed: 5 hours ago

Response Rate
100.0 %
Response Time
40.9 hours

Equipped with a spin cleaning unit that uses functional water. Adoption of cleaning solution and cleaning method that replaces RCA cleaning solutio...



Check the product list of M.WATANABE & CO.,LTD.

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