Oxford Instruments Ltd.'s FPD Manufacturing Equipment

4 products found

Oxford Instruments Ltd.

Achieves smooth surfaces with low damage PlasmaPro 100 ALE Atomic Layer Etching System

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Last viewed: 4 hours ago

■Summary The PlasmaPro 100 ALE atomic layer etch system enables precise control of etching of next generation semiconductor devices. Specifically d...

Oxford Instruments Ltd.

Achieving high-speed etching rates PlasmaPro 100 Cobra ICP RIE etching system

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Last viewed: 7 hours ago

■Summary The PlasmaPro 100 Cobra ICP RIE system uses high-density inductively coupled plasma to achieve fast etch rates. This process module suppor...

Oxford Instruments Ltd.

Platform for DRIE applications PlasmaPro 100 Estrelas DRIE

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Last viewed: 7 hours ago

The PlasmaPro 100 Estrelas platform is designed for total flexibility for deep reactive ion etching (DRIE) applications. We can meet the diverse pr...

Oxford Instruments Ltd.

Isotropic and anisotropic dry etching PlasmaPro 100 RIE compatible with a wide range of processes

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Last viewed: 7 hours ago

The PlasmaPro 100 RIE module provides isotropic and anisotropic dry etching for a wide range of processes. Suitable for research and manufacturing ...

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Oxford Instruments Ltd.'s FPD Manufacturing Equipment

Achieves smooth surfaces with low damage PlasmaPro 100 ALE Atomic Layer Etching System

Achieving high-speed etching rates PlasmaPro 100 Cobra ICP RIE etching system

Platform for DRIE applications PlasmaPro 100 Estrelas DRIE

Isotropic and anisotropic dry etching PlasmaPro 100 RIE compatible with a wide range of processes

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