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  3. Chemical Vapor Deposition (CVD) Systems
  4. M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.'s Chemical Vapor Deposition (CVD) Systems

M.WATANABE & CO.,LTD.

6 products found

Semiconductor manufacturing equipment High performance single wafer atmospheric pressure CVD (APCVD) equipment (A200V)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High performance single wafer atmospheric pressure CVD (APCVD) equipment (A200V)

490+ people viewing

Single-wafer atmospheric pressure CVD (APCVD) equipment for forming NSG (SiO2) /PSG/BPSG films for small quantities and a wide variety of products ...


Semiconductor manufacturing equipment Continuous normal pressure CVD equipment for mass production of solar cells (AMAX1000S)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Continuous normal pressure CVD equipment for mass production of solar cells (AMAX1000S)

380+ people viewing

Last viewed: 1 day ago

High productivity continuous atmospheric pressure CVD (APCVD) equipment for mass production of crystalline Si solar cells NSG (SiO2) /PSG/BSG film ...


Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)

550+ people viewing

Last viewed: 1 day ago

High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible wit...


Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX800V)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX800V)

470+ people viewing

Last viewed: 1 day ago

High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible wit...


Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)

470+ people viewing

Last viewed: 12 hours ago

Batch type (simultaneous processing of multiple sheets) APCVD equipment for NSG (SiO2) /BSG/PSG/BPSG film formation for prototyping, development, a...


Semiconductor manufacturing equipment Low-temperature film deposition Compatible with flexible substrates Glass substrate film deposition equipment-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Low-temperature film deposition Compatible with flexible substrates Glass substrate film deposition equipment

350+ people viewing

Last viewed: 1 day ago

This is a 4.5 generation glass substrate deposition system compatible with rigid/flexible devices such as FPDs. ■Basic information Equipped with t...



Check the product list of M.WATANABE & CO.,LTD.

Related Categories for Chemical Vapor Deposition (CVD) Systems

Semiconductor Lithography Equipment Semiconductor Manufacturing Equipment Component & Part Machining Lithographers Chemical Mechanical Polishing (CMP) Machines ALD Systems Reflow Machines Resist Coaters Electron Beam Lithography Systems Ion Implanters PVDF Bernoulli Chucks Wire Bonders Bonding Wire Flip Chip Bonders Silicon Wafers Microelectronics & Semiconductor Packages

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