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  3. Chemical Vapor Deposition (CVD) Systems
  4. M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.'s Chemical Vapor Deposition (CVD) Systems

M.WATANABE & CO.,LTD.

6 products found

Semiconductor manufacturing equipment High performance single wafer atmospheric pressure CVD (APCVD) equipment (A200V)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High performance single wafer atmospheric pressure CVD (APCVD) equipment (A200V)

190+ people viewing

Response Rate
100.0 %
Response Time
37.2 hours

Single-wafer atmospheric pressure CVD (APCVD) equipment for forming NSG (SiO2) /PSG/BPSG films for small quantities and a wide variety of products ...


Semiconductor manufacturing equipment Continuous normal pressure CVD equipment for mass production of solar cells (AMAX1000S)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Continuous normal pressure CVD equipment for mass production of solar cells (AMAX1000S)

150+ people viewing

Last viewed: 17 hours ago

Response Rate
100.0 %
Response Time
37.2 hours

High productivity continuous atmospheric pressure CVD (APCVD) equipment for mass production of crystalline Si solar cells NSG (SiO2) /PSG/BSG film ...


Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)

190+ people viewing

Last viewed: 15 hours ago

Response Rate
100.0 %
Response Time
37.2 hours

High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible wit...


Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX800V)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX800V)

190+ people viewing

Last viewed: 1 day ago

Response Rate
100.0 %
Response Time
37.2 hours

High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible wit...


Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)

210+ people viewing

Last viewed: 22 hours ago

Response Rate
100.0 %
Response Time
37.2 hours

Batch type (simultaneous processing of multiple sheets) APCVD equipment for NSG (SiO2) /BSG/PSG/BPSG film formation for prototyping, development, a...


Semiconductor manufacturing equipment Low-temperature film deposition Compatible with flexible substrates Glass substrate film deposition equipment-M.WATANABE & CO.,LTD.

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Low-temperature film deposition Compatible with flexible substrates Glass substrate film deposition equipment

130+ people viewing

Last viewed: 7 hours ago

Response Rate
100.0 %
Response Time
37.2 hours

This is a 4.5 generation glass substrate deposition system compatible with rigid/flexible devices such as FPDs. ■Basic information Equipped with t...



Check the product list of M.WATANABE & CO.,LTD.

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