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M.WATANABE & CO.,LTD.'s Chemical Vapor Deposition (CVD) Systems

M.WATANABE & CO.,LTD.

6 products found

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High performance single wafer atmospheric pressure CVD (APCVD) equipment (A200V)

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Last viewed: 1 hour ago

Single-wafer atmospheric pressure CVD (APCVD) equipment for forming NSG (SiO2) /PSG/BPSG films for small quantities and a wide variety of products ...

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Continuous normal pressure CVD equipment for mass production of solar cells (AMAX1000S)

180+ people viewing

High productivity continuous atmospheric pressure CVD (APCVD) equipment for mass production of crystalline Si solar cells NSG (SiO2) /PSG/BSG film ...

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)

230+ people viewing

Last viewed: 13 hours ago

High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible wit...

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX800V)

230+ people viewing

Last viewed: 1 day ago

High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible wit...

M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)

260+ people viewing

Batch type (simultaneous processing of multiple sheets) APCVD equipment for NSG (SiO2) /BSG/PSG/BPSG film formation for prototyping, development, a...


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