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  4. Semiconductor manufacturing equipment Cleaning equipment Lift-off system VAP200TM/VAP300TM (TAZMO CO.,LTD.)
Semiconductor manufacturing equipment Cleaning equipment Lift-off system VAP200TM/VAP300TM-VAP200TM/VAP300TM
Semiconductor manufacturing equipment Cleaning equipment Lift-off system VAP200TM/VAP300TM-TAZMO CO.,LTD.

Semiconductor manufacturing equipment Cleaning equipment Lift-off system VAP200TM/VAP300TM
TAZMO CO.,LTD.

About This Product

It has a unique equipment configuration that combines a batch immersion type cleaning module and a single wafer type cleaning module, making it suitable for stripping photoresists and films.

■Product features

·platform By combining batch cleaning in the batch dipping tank with precision cleaning in the single wafer processing chamber, clean peeling processing can be performed with efficient takt time. We can also handle high-temperature chemical treatment and high-pressure spray treatment. Explosion-proof specifications are also available as an option. ・Process unit The hardware configuration is compatible with a wide variety of organic solvents. Compatible with 8" and 12" diameters. ・Easy to operate It has an interface with excellent visibility.

  • Product

    Semiconductor manufacturing equipment Cleaning equipment Lift-off system VAP200TM/VAP300TM

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1 Models of Semiconductor manufacturing equipment Cleaning equipment Lift-off system VAP200TM/VAP300TM

Image Part Number Price (excluding tax) Applicable work
Semiconductor manufacturing equipment Cleaning equipment Lift-off system VAP200TM/VAP300TM-Part Number-VAP200TM/VAP300TM

VAP200TM/VAP300TM

Available upon quote

Φ200 & 300mm wafer

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About Company Handling This Product

TAZMO CO.,LTD.

Company Overview

TAZMO CO., LTD., founded in 1972 and based in Okayama, Japan, is a manufacturer and distributor of advanced ma...

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