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Maskless exposure equipment 3D shape laser exposure equipment-3D shape laser exposure equipment
Maskless exposure equipment 3D shape laser exposure equipment-Neoark Co., Ltd.

Maskless exposure equipment 3D shape laser exposure equipment
Neoark Co., Ltd.

Neoark Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

67.6hours


About This Product

■Realizes photolithography to create three-dimensional shapes

Photolithography is used in a wide range of fields, but it is generally applied to flat works. However, as devices have become increasingly smaller, have higher performance, and have improved design, there are an increasing number of situations in which conventional photolithography for flat surfaces is insufficient, and the realization of photolithography for three-dimensional shapes is expected. I'm here. By controlling the 5-axis stage, this device can expose arbitrary patterns on various three-dimensionally shaped workpieces without a mask, and can be used for research and development aimed at next-generation products. Masu.

■5-axis stage that enables photolithography to create 3D shapes

With conventional XYZ linear motion stages, the angle of incidence changes with respect to the exposure point of a 3D workpiece, resulting in a difference in exposure quality. By adopting a 5-axis stage with 3 linear axes and 2 rotary axes, it is now possible to freely irradiate any point on a 3D workpiece while keeping the laser incident angle constant. By performing simultaneous interpolation operation on up to 5 axes + feedback control, uniform velocity motion is achieved and highly accurate patterning is possible.

■Assist function that uses two types of autofocus

Corrects workpiece mounting errors and corrects focus during patterning in a non-contact manner without damaging the workpiece or delicate resist. ・Correction By performing contrast autofocus at multiple points using the observation camera, the error in the mounting angle of the workpiece is calculated and corrected. (Workpiece installation error correction) ・Using triangulation autofocus using a red laser, focus errors that occur during patterning are calculated and corrected in real time. (Focus correction during patterning)

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    Maskless exposure equipment 3D shape laser exposure equipment

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1 Models of Maskless exposure equipment 3D shape laser exposure equipment

Image Part Number Price (excluding tax) Exposure light source Device configuration Equipment dimensions Minimum exposure line width Maximum work size Objective lens Stage configuration
Maskless exposure equipment 3D shape laser exposure equipment-Part Number-3D shape laser exposure equipment

3D shape laser exposure equipment

Available upon quote

375nm semiconductor laser

Equipment main unit, control computer, dedicated software

W1000 × H1800 × D900 (mm)

10μm or less
*Varies depending on the objective lens used, resist type, and resist thickness.

Cube with one side less than 100mm

NUV exclusive design 2x / NUV 10x

5 axis stage
XY axis: Straight 300mm stroke
Z axis: Straight 200mm stroke
α axis: rotation 360°
Beta axis: rotation 90°

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About Company Handling This Product

Response Rate

100.0%


Response Time

67.6hrs

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