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  3. FPD Lithography Equipment
  4. Maskless exposure system PALET manual stage model DDB-701-MS (Neoark Co., Ltd.)
Maskless exposure system PALET manual stage model DDB-701-MS-DDB-701-MS
Maskless exposure system PALET manual stage model DDB-701-MS-Neoark Co., Ltd.

Maskless exposure system PALET manual stage model DDB-701-MS
Neoark Co., Ltd.

Neoark Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

67.6hours

About This Product

■Making photolithography more accessible

Semiconductors were once called the "rice of industry". The technology that underpins the semiconductor process is "photolithography." The fields in which photolithography is required have expanded over time, and it has now become a representative microfabrication technology used in a wide variety of fields, including MEMS, physical property research, and biotechnology. On the other hand, not only photolithography equipment for semiconductors that has reached a few nanometers, but even existing equipment that exposes submicron patterns have large equipment sizes, equipment prices in the tens of millions to hundreds of millions of yen, and environmental issues. The reality is that the hurdles to introduction are extremely high, such as the equipment, ancillary equipment, and the high level of skill required of users. For researchers and engineers who are interested in microfabrication, but don't have the infrastructure nearby, this hurdle is enough to make them give up on the development theme. The "Maskless Lithography System PALET" has a size that allows it to be installed anywhere, a price that breaks the conventional wisdom of maskless exposure equipment, and simple operability that allows you to create any pattern you come up with on the spot. Product specifications that remove hurdles from the user's perspective are ideal for research and prototyping applications where trial and error is essential. Through this maskless exposure system PALET, we hope to make photolithography more accessible and help accelerate various research.

■Low price setting that overturns common sense in the industry

``Maskless exposure equipment is convenient, but it costs tens of millions of yen, so let's give up on introducing it.'' In order to break the common sense, we have boldly narrowed down the functions and achieved overwhelming cost performance.Furthermore, we have achieved unprecedented cost performance for maskless exposure equipment. Lineup includes manual stage models. You can prepare a research environment by reducing initial investment. With a maximum exposure area of ​​25mm and a minimum exposure line width of 3μm, you can choose your research area, and our high degree of freedom and low installation costs will strongly assist your research and development.

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    Maskless exposure system PALET manual stage model DDB-701-MS

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1 Models of Maskless exposure system PALET manual stage model DDB-701-MS

Image Part Number Price (excluding tax) Exposure area Configuration (common) Body external dimensions/mass Minimum exposure line width Objective lens Supported file formats Light source Work size Exposure time per shot Exposure area per shot Utility Stage
Maskless exposure system PALET manual stage model DDB-701-MS-Part Number-DDB-701-MS

DDB-701-MS

Available upon quote

25mm x 25mm

Device main unit, control PC, software

300mm (W) × 450mm (D) × 450mm (H),
Approximately 30kg

3μm・15μm

10x/2x

Image data (JPEG / PNG / BITMAP), PowerPoint data (XPS), CAD data (DXF)

365nm (typ.) LED

Maximum Φ60mm, thickness 3mm

Approximately 1 second/approximately 15 seconds

Approximately 1mm × 0.6mm・Approximately 5mm × 3mm

AC100V, power consumption 1.5kW or less

Manual XYZθ stage

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About Company Handling This Product

Neoark Co., Ltd.

Response Rate

100.0%

Response Time

67.6hrs

  • Japan

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