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  1. Metoree
  2. Semiconductor Manufacturing
  3. Ion Implanters
  4. Semiconductor materials Ion implantation materials (Yamanaka Advanced Material Co., Ltd.)

Semiconductor materials Ion implantation materials
Yamanaka Advanced Material Co., Ltd.

Yamanaka Advanced Material Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

63.2hours

About This Product

We provide ion implantation materials used for "impurity addition" in semiconductor processes. The ion implantation materials we handle include gas materials and solid materials. The concentrated boron trifluoride that we provide is a product that has concentrated 11B, which is used in semiconductors, to >99.8% (natural boron only contains about 81% 11B), and is a product that is made by ion implantation. Increase throughput and production efficiency in the process. We also offer germanium tetrafluoride as a shallow dope material.

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    Semiconductor materials Ion implantation materials

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1 Models of Semiconductor materials Ion implantation materials

Image Part Number Price (excluding tax) Purity Chemical formula

Gas material Concentrated boron trifluoride

Available upon quote

4N

11BF3

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About Company Handling This Product

Yamanaka Advanced Material Co., Ltd.

Response Rate

100.0%

Response Time

63.2hrs

  • Japan

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Ion Implanters
Ion Implanters　Yamanaka Advanced Material Co., Ltd.
Yamanaka Advanced Material Co., Ltd.

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