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  4. Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6 (ULVAC Sales Co., Ltd.)
Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6-RTP-6
Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6-ULVAC Sales Co., Ltd.

Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6
ULVAC Sales Co., Ltd.

ULVAC Sales Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

125.8hours

About This Product

■Summary

Lamp annealing equipment up to 6 inches. Silicide formation for individual semiconductor processes and process annealing for compound semiconductors are possible.

■Applications

Rapid heat treatment of Si wafers possible

■Features

Due to the cold wall structure, there is no heavy metal contamination.

  • Product

    Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6

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1 Models of Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6

Image Part Number Price (excluding tax) Sample size Measurement atmosphere Temperature range Application
Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6-Part Number-RTP-6

RTP-6

Available upon quote

4 inch ~ 6 inch wafer size

In gas, in gas flow, in atmosphere

Room temperature ~1,000℃

Turbo molecular pump/rotary pump exhaust set
Cooling water circulation device
pyrometer control
SiC carbon susceptor

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About Company Handling This Product

ULVAC Sales Co., Ltd.

Response Rate

100.0%

Response Time

125.8hrs

  • Japan

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