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  4. Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6 (ULVAC Sales Co., Ltd.)
Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6-RTP-6
Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6-ULVAC Sales Co., Ltd.

Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6
ULVAC Sales Co., Ltd.

About This Product

■Summary Lamp annealing equipment up to 6 inches. Silicide formation for individual semiconductor processes and process annealing for compound semiconductors are possible. ■Applications Rapid heat treatment of Si wafers possible ■Features Due to the cold wall structure, there is no heavy metal contamination.

  • Product

    Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6

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1 Models of Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6

Product Image Part Number Price (excluding tax)
Heat treatment/heating equipment Infrared image furnace Experimental use Infrared lamp heating equipment RTP-6-Part Number-RTP-6

RTP-6

Available upon quote

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About Company Handling This Product

ULVAC Sales Co., Ltd.

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