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History
Response Rate
100.0%
Response Time
94.6hours
Product
Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipmentHandling Company
Y Drive Co., Ltd.Categories
Click on the part number for more information about each product
Image | Part Number | Price (excluding tax) | Repeated exposure function | Reference hole position adjustment function | Laser scanning width | Laser wavelength | Laser spot diameter (@laser wavelength 405nm) | Focus confirmation unit | Focus unit (manual operation) | Data resolution | Data format | Air chuck table | Body external dimensions |
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LSU-1002 |
Available upon quote |
A function to expose a job any number of times in the stage feed direction |
Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks |
10mm |
375,405,650,780,830nm (semiconductor laser) |
2μm |
CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface |
Z stage |
~25,400dpi |
Bitmap (BMP) |
Ceramic table or aluminum table |
- |
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LSU-6010 |
Available upon quote |
A function to expose a job any number of times in the stage feed direction |
Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks |
60mm |
375,405,650,780,830nm (semiconductor laser) |
10μm |
CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface |
Z stage |
~5,080dpi |
Bitmap (BMP) |
Ceramic table or aluminum table |
400×500×460mm |
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LSU-12522 |
Available upon quote |
A function to expose a job any number of times in the stage feed direction |
Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks |
125mm |
375,405,650,780,830nm (semiconductor laser) |
22μm |
CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface |
Z stage |
~3,000dpi |
Bitmap (BMP) |
Ceramic table or aluminum table |
- |
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LSU-25030 |
Available upon quote |
A function to expose a job any number of times in the stage feed direction |
Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks |
250mm |
375,405,650,780,830nm (semiconductor laser) |
30μm |
CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface |
Z stage |
~1,500dpi |
Bitmap (BMP) |
Ceramic table or aluminum table |
- |
Click on the part number for more information about each product
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Reviews shown here are reviews of companies.
Response Rate
100.0%
Response Time
94.6hrs