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Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment-LSU-1002
Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment-Y Drive Co., Ltd.

Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment
Y Drive Co., Ltd.

Y Drive Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

94.6hours


About This Product

Laser exposure uses a telecentric fθ lens, so the beam shape is the same across the entire scanning width, allowing for highly accurate drawing. The main body of the direct drawing device is compact, making it space-saving and ideal for high-definition exposure of a wide variety of products in small lots.

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    Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment

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4 Models of Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment

Click on the part number for more information about each product

Image Part Number Price (excluding tax) Repeated exposure function Reference hole position adjustment function Laser scanning width Laser wavelength Laser spot diameter (@laser wavelength 405nm) Focus confirmation unit Focus unit (manual operation) Data resolution Data format Air chuck table Body external dimensions
Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment-Part Number-LSU-1002

LSU-1002

Available upon quote

A function to expose a job any number of times in the stage feed direction

Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks

10mm

375,405,650,780,830nm (semiconductor laser)
355,488,532nm (solid-state laser)

2μm

CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface

Z stage

~25,400dpi

Bitmap (BMP)

Ceramic table or aluminum table

-
Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment-Part Number-LSU-6010

LSU-6010

Available upon quote

A function to expose a job any number of times in the stage feed direction

Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks

60mm

375,405,650,780,830nm (semiconductor laser)
355,488,532nm (solid-state laser)

10μm

CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface

Z stage

~5,080dpi

Bitmap (BMP)

Ceramic table or aluminum table

400×500×460mm

Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment-Part Number-LSU-12522

LSU-12522

Available upon quote

A function to expose a job any number of times in the stage feed direction

Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks

125mm

375,405,650,780,830nm (semiconductor laser)
355,488,532nm (solid-state laser)

22μm

CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface

Z stage

~3,000dpi

Bitmap (BMP)

Ceramic table or aluminum table

-
Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment-Part Number-LSU-25030

LSU-25030

Available upon quote

A function to expose a job any number of times in the stage feed direction

Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks

250mm

375,405,650,780,830nm (semiconductor laser)
355,488,532nm (solid-state laser)

30μm

CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface

Z stage

~1,500dpi

Bitmap (BMP)

Ceramic table or aluminum table

-

Click on the part number for more information about each product

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About Company Handling This Product

Response Rate

100.0%


Response Time

94.6hrs

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