Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment
Y Drive Co., Ltd.
About This Product
Laser exposure uses a telecentric fθ lens, so the beam shape is the same across the entire scanning width, allowing for highly accurate drawing. The main body of the direct drawing device is compact, making it space-saving and ideal for high-definition exposure of a wide variety of products in small lots.
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Product
Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment
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Handling Company
Y Drive Co., Ltd.
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Categories
4 Models of Various FPD components The beam shape is the same throughout the entire scanning width, enabling high-precision writing Telecenter fθ Laser direct writing equipment
Items marked with have different values depending on the model number.
Click on the part number for more information about each product
| Product Image | Part Number | Price (excluding tax) | Air chuck table | Body external dimensions | Data format | Data resolution | Focus confirmation unit | Focus unit (manual operation) | Laser scanning width | Laser spot diameter (@laser wavelength 405nm) | Laser wavelength | Reference hole position adjustment function | Repeated exposure function |
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LSU-1002 |
Available upon quote | Ceramic table or aluminum table | - | Bitmap (BMP) | ~25,400dpi | CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface | Z stage | 10mm | 2μm |
375,405,650,780,830nm (semiconductor laser) 355,488,532nm (solid-state laser) |
Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks | A function to expose a job any number of times in the stage feed direction |
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LSU-6010 |
Available upon quote | Ceramic table or aluminum table | 400×500×460mm | Bitmap (BMP) | ~5,080dpi | CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface | Z stage | 60mm | 10μm |
375,405,650,780,830nm (semiconductor laser) 355,488,532nm (solid-state laser) |
Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks | A function to expose a job any number of times in the stage feed direction |
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LSU-12522 |
Available upon quote | Ceramic table or aluminum table | - | Bitmap (BMP) | ~3,000dpi | CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface | Z stage | 125mm | 22μm |
375,405,650,780,830nm (semiconductor laser) 355,488,532nm (solid-state laser) |
Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks | A function to expose a job any number of times in the stage feed direction |
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LSU-25030 |
Available upon quote | Ceramic table or aluminum table | - | Bitmap (BMP) | ~1,500dpi | CCD camera optical unit, monitor: Focus using the Z stage while checking the focus status of the exposed surface | Z stage | 250mm | 30μm |
375,405,650,780,830nm (semiconductor laser) 355,488,532nm (solid-state laser) |
Reference hole confirmation optical system, monitor, X-axis and θ-axis stage; Exposure positioning mechanism from reference pins and marks | A function to expose a job any number of times in the stage feed direction |
Click on the part number for more information about each product
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About Company Handling This Product
- Japan