Etching processing
ANOVA

About This Product

Precision processing technology using photographic technology

Step flow
1. In Photoriso, protect the metal film of the required part with the POSI regist
2. Use an acidic acid -based solution that dissolves metal to remove the metal film of unnecessary parts
3. Escape the POSI resist that protected the metal film

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There are 1 models for this product.

Product
Etching processing

Handling Company
ANOVA

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Processing Services

Etching Processes

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1 Models of Etching processing

Image	Part Number	Price (excluding tax)	Etched device	Processing results ITO	Processing results MAM
	Etching processing	Available upon quote	ITO, AL alloy, MAM, CR	L/S = 10 μm/10 μm (prototype MIN value 5 μm/10 μm)	L/S = 8μm/10 μm (prototype MIN value 6 μm/10 μm)

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Etching processing ANOVA

About This Product

1 Models of Etching processing