Photoliso processing
ANOVA
About This Product
It is a fine pattern creation technology that applies photo development technology.
Step flow
1. Previous cleaning
WET Pharmaceutical Washer removes foreign substances and dirt on the surface of the substrate.
2. Slit coat → spin coat
Apply a sensitive resin material (resist) to the substrate.
3. Prebek
Exposure, temporary drying before development.
4. Exposure → development
Use a pattern mask to make the registry sensitivity with UV light. After the exposure, remove excess regists with development.
･ Negative type: The sensitivity part remains as a pattern.
･ Positive type: The sensitivity part melts by development.
5. Postbok
After the pattern formation, bake the register. (Hondoyaki)
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Product
Photoliso processing
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Handling Company
ANOVA
1 Models of Photoliso processing
| Product Image | Part Number | Price (excluding tax) | Coach device | Exposure machine | Resist type |
|---|---|---|---|---|---|
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Photoliso processing |
Available upon quote | Slits & spin coat, spinless coat | Proxymity batch exposure, high -pressure mercury lamp (GHI line) | Various screw -type resists, positive regists * Fine pattern processing is possible |
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