Photoliso processing-Photoliso processing

Photoliso processing
ANOVA

About This Product

It is a fine pattern creation technology that applies photo development technology.


Step flow
1. Previous cleaning
WET Pharmaceutical Washer removes foreign substances and dirt on the surface of the substrate.

2. Slit coat → spin coat
Apply a sensitive resin material (resist) to the substrate.

3. Prebek
Exposure, temporary drying before development.

4. Exposure → development
Use a pattern mask to make the registry sensitivity with UV light. After the exposure, remove excess regists with development.
･ Negative type: The sensitivity part remains as a pattern.
･ Positive type: The sensitivity part melts by development.

5. Postbok
After the pattern formation, bake the register. (Hondoyaki)

Model
There are 1 models for this product.

Product
Photoliso processing

Handling Company
ANOVA

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1 Models of Photoliso processing

Image	Part Number	Price (excluding tax)	Coach device	Exposure machine	Resist type
	Photoliso processing	Available upon quote	Slits & spin coat, spinless coat	Proxymity batch exposure, high -pressure mercury lamp (GHI line)	Various screw -type resists, positive regists * Fine pattern processing is possible