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  4. Thin film production equipment PVD equipment Hybrid vapor deposition equipment (Kitano Seiki Co., Ltd.)
Thin film production equipment PVD equipment Hybrid vapor deposition equipment-Hybrid vapor deposition equipment
Thin film production equipment PVD equipment Hybrid vapor deposition equipment-Kitano Seiki Co., Ltd.

Thin film production equipment PVD equipment Hybrid vapor deposition equipment
Kitano Seiki Co., Ltd.

About This Product

■Features

This equipment is a hybrid type evaporation equipment equipped with 4 magnetron sputter sources using PVD method, 2 EB evaporation sources, and K-CELL for MBE. Ferromagnetic materials, which are generally difficult to use in combination with a wide variety of materials such as high melting point materials and oxides, can be made possible by adding a configuration to opposed magnetron sputtering. The multi-port on the lower flange can also be equipped with an MBE deposition cell, making it a highly versatile multi-chamber system that can be configured to combine all PVD methods, including RHEED and laser introduction, allowing for long-term use as a device that does not depend on research themes. It can be done.

■Configuration

・φ300 ultra-high vacuum multi-chamber (with LN2 shroud) ・Transportation chamber chamber ・Electron gun for deposition x 2 ・2 inch sputter source x 2 ・K-CELL×2 units ・Manipulator with 4-axis heating mechanism ・TMP&SP exhaust unit ・RHEED+3 inch screen

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    Thin film production equipment PVD equipment Hybrid vapor deposition equipment

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1 Models of Thin film production equipment PVD equipment Hybrid vapor deposition equipment

Image Part Number Price (excluding tax) Sample transport Substrate heating temperature Board size Ultimate vacuum
Thin film production equipment PVD equipment Hybrid vapor deposition equipment-Part Number-Hybrid vapor deposition equipment

Hybrid vapor deposition equipment

Available upon quote

Transfer rod

Max1,000℃

2 inches

≦1.0E-7Pa

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Kitano Seiki Co., Ltd.

  • Japan

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