Thin film production equipment PVD equipment Hybrid vapor deposition equipment
Kitano Seiki Co., Ltd.
About This Product
■Features
This equipment is a hybrid type evaporation equipment equipped with 4 magnetron sputter sources using PVD method, 2 EB evaporation sources, and K-CELL for MBE. Ferromagnetic materials, which are generally difficult to use in combination with a wide variety of materials such as high melting point materials and oxides, can be made possible by adding a configuration to opposed magnetron sputtering.
The multi-port on the lower flange can also be equipped with an MBE deposition cell, making it a highly versatile multi-chamber system that can be configured to combine all PVD methods, including RHEED and laser introduction, allowing for long-term use as a device that does not depend on research themes. It can be done.
■Configuration
・φ300 ultra-high vacuum multi-chamber (with LN2 shroud)
・Transportation chamber chamber
・Electron gun for deposition x 2
・2 inch sputter source x 2
・K-CELL×2 units
・Manipulator with 4-axis heating mechanism
・TMP&SP exhaust unit
・RHEED+3 inch screen
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Product
Thin film production equipment PVD equipment Hybrid vapor deposition equipment
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Handling Company
Kitano Seiki Co., Ltd.
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Categories
1 Models of Thin film production equipment PVD equipment Hybrid vapor deposition equipment
| Product Image | Part Number | Price (excluding tax) | Board size | Sample transport | Substrate heating temperature | Ultimate vacuum |
|---|---|---|---|---|---|---|
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Hybrid vapor deposition equipment |
Available upon quote | 2 inches | Transfer rod | Max1,000℃ | ≦1.0E-7Pa |
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About Company Handling This Product
- Japan