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  3. Vacuum Vapor Deposition Devices
  4. Thin film production equipment Electron beam evaporation equipment Large EB evaporation equipment (Kitano Seiki Co., Ltd.)
Thin film production equipment Electron beam evaporation equipment Large EB evaporation equipment-Large EB evaporation equipment
Thin film production equipment Electron beam evaporation equipment Large EB evaporation equipment-Kitano Seiki Co., Ltd.

Thin film production equipment Electron beam evaporation equipment Large EB evaporation equipment
Kitano Seiki Co., Ltd.

Kitano Seiki Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

22.5hours

Relatively Fast Response

About This Product

■Features

This device is a high melting point metal evaporation device using electron beam (EB). This device uses a rotating/revolving planetary to achieve high material usage efficiency and high film properties. Furthermore, by being equipped with a large-capacity hearth (crucible) and an electron gun with a maximum output of 30kW, it is possible to rapidly form films as thick as several hundred micrometers. Furthermore, for film thickness control, we have achieved high precision measurement using a crystal oscillator using our proprietary technology that is suitable for high rate/high film thickness.

■Device configuration

・φ800 high vacuum chamber ・Electron gun for deposition ・DP&RP exhaust unit ・Cryocooler ・Cooling water circulation device ・Equipment control panel

  • Product

    Thin film production equipment Electron beam evaporation equipment Large EB evaporation equipment

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1 Models of Thin film production equipment Electron beam evaporation equipment Large EB evaporation equipment

Image Part Number Price (excluding tax) Electron gun Device control Substrate heating temperature Ultimate vacuum Planetary
Thin film production equipment Electron beam evaporation equipment Large EB evaporation equipment-Part Number-Large EB evaporation equipment

Large EB evaporation equipment

Available upon quote

Maximum output 30kW (15kW2A)

Fully automatic operation is possible 24 hours a day with automatic exhaust and automatic start-up using a PLC (programmable logic controller).

Max450℃

≦1.0E-5Pa

By orbiting in the same orbit during vapor deposition and rotating on its own axis, highly uniform film formation is possible.

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About Company Handling This Product

Kitano Seiki Co., Ltd.

Response Rate

100.0%

Response Time

22.5hrs

  • Japan

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Vacuum Vapor Deposition Devices　Kitano Seiki Co., Ltd.
Kitano Seiki Co., Ltd.

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