Thin film production equipment Electron beam evaporation equipment Large EB evaporation equipment
Kitano Seiki Co., Ltd.
About This Product
■Features
This device is a high melting point metal evaporation device using electron beam (EB). This device uses a rotating/revolving planetary to achieve high material usage efficiency and high film properties. Furthermore, by being equipped with a large-capacity hearth (crucible) and an electron gun with a maximum output of 30kW, it is possible to rapidly form films as thick as several hundred micrometers.
Furthermore, for film thickness control, we have achieved high precision measurement using a crystal oscillator using our proprietary technology that is suitable for high rate/high film thickness.
■Device configuration
・φ800 high vacuum chamber
・Electron gun for deposition
・DP&RP exhaust unit
・Cryocooler
・Cooling water circulation device
・Equipment control panel
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Product
Thin film production equipment Electron beam evaporation equipment Large EB evaporation equipment
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Handling Company
Kitano Seiki Co., Ltd.
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Categories
1 Models of Thin film production equipment Electron beam evaporation equipment Large EB evaporation equipment
| Product Image | Part Number | Price (excluding tax) | Device control | Electron gun | Planetary | Substrate heating temperature | Ultimate vacuum |
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Large EB evaporation equipment |
Available upon quote | Fully automatic operation is possible 24 hours a day with automatic exhaust and automatic start-up using a PLC (programmable logic controller). | Maximum output 30kW (15kW2A) | By orbiting in the same orbit during vapor deposition and rotating on its own axis, highly uniform film formation is possible. | Max450℃ | ≦1.0E-5Pa |
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About Company Handling This Product
- Japan