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Thin film production equipment 4-element magnetron sputtering equipment-Quaternary magnetron sputtering equipment
Thin film production equipment 4-element magnetron sputtering equipment-Kitano Seiki Co., Ltd.

Thin film production equipment 4-element magnetron sputtering equipment
Kitano Seiki Co., Ltd.

Kitano Seiki Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

22.5hours

Relatively Fast Response


About This Product

This equipment is a Brainer type magnetron sputtering equipment that uses a DC magnetron sputtering source. This is an ultra-high vacuum compatible type that has our own load lock chamber. It has a sample rotation type that allows for uniform film formation during film formation. In addition, sample cooling is possible while rotating to eliminate sample damage. The structure allows up to four targets to be attached, allowing multilayer film formation. It is a multi-chamber compatible type with future prospects in mind, so it can be easily connected to the equipment you are currently using.

■Specifications

・All vacuum components except the vacuum gauge can be repeatedly baked at temperatures above 200℃. ・Ultra-high vacuum compatible chamber, leak amount by He leak detector is 1.33×10^-11Pa・m3/sec or less ・You can use a board holder (made by Mo) that supports 2-inch boards. ・The substrate holder can be safely transported manually to the holder fixing mechanism on the sample stage using our optional transfer rod. ・The pedestal is equipped with casters and level adjustment function.

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    Thin film production equipment 4-element magnetron sputtering equipment

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1 Models of Thin film production equipment 4-element magnetron sputtering equipment

Image Part Number Price (excluding tax) Ultra-high vacuum chamber high temperature treatment Ultra-high vacuum chamber surface treatment Ultra-high vacuum chamber material Ultra-high vacuum chamber shape Ultra-high vacuum chamber ultimate vacuum Ultra-high vacuum chamber leakage amount Ultra-high vacuum chamber port Film thickness sensor movement mechanism Liquid nitrogen shroud material Liquid nitrogen shroud method Liquid nitrogen shroud treatment Liquid nitrogen shroud leakage amount Trestle Compressed air Lower flange high temperature treatment Lower flange surface treatment Lower flange material Lower flange shape Lower flange leakage amount Bottom flange port Motor controller Main shutter mechanism method Sample heating heater method Sample heating heater reached temperature Sample heating heater Heater material AC200V AC100V 3-axis manipulator tilt direction 3-axis manipulator Z direction 3-axis manipulator R direction
Thin film production equipment 4-element magnetron sputtering equipment-Part Number-Quaternary magnetron sputtering equipment

Quaternary magnetron sputtering equipment

Available upon quote

Vacuum baking at 450℃ x 48 hours or more

Composite electrolytic polishing mirror finish

SUS316L

ICF-356-N Special/203/152/114/70

1×10^-11Torr or less (when using liquid nitrogen shroud cooling and turbo molecular pump of 300l/s or more or ion pump of 300l/s or more)

5×10^-11Pa・m3/sec

ICF-203, ICF-152, ICF-114, ICF-70

Sensor: Crystal oscillator (optional)
Mounting flange: ICF-70
Travel distance: 100mm (accuracy 0.1mm)

Stainless steel 316L

Liquid nitrogen storage type (uses 8/3″ pipe)

Buffing mirror finish, heat cycle treatment (10 times)

5×10^-8Pa・m3/sec

Material: SS material/Baked paint treatment (black)
Dimensions: 600 x 1,200 x 1,500 (with casters and adjusters)

5kg/cm2

Vacuum baking at 450℃ x 48 hours or more

Composite electrolytic polishing mirror finish

SUS316L

ICF-356/152×4/70×1

5×10^-11Pa・m3/sec

ICF-203, ICF-152, ICF-114, ICF-70

Controller for stepping motor
Comes with special box

Transfer rod method (optional/motor drive)

Claw retainer type

Base surface temperature Max1,200℃

Ta (heater part) Molybdenum (main body)
A rotary joint is used for the electrode.

Three phase 20A

Single phase 30A

90° (vertical mechanism KUD-114/70SP) motor drive

100mm (vertical mechanism KUD-114/100Z) motor drive

360° (∞) (rotating platform KMRP-114) motor drive

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About Company Handling This Product

Response Rate

100.0%


Response Time

22.5hrs

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