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Thin film production equipment Magnetron sputtering deposition equipment-Magnetron sputtering deposition equipment
Thin film production equipment Magnetron sputtering deposition equipment-Kitano Seiki Co., Ltd.

Thin film production equipment Magnetron sputtering deposition equipment
Kitano Seiki Co., Ltd.

Kitano Seiki Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

22.5hours

Relatively Fast Response


About This Product

■Features

This equipment is a Brainer-type magnetron sputtering ultra-high vacuum thin film production equipment using a DC magnetron sputtering source. It has a sample holder rotation mechanism that enables uniform film formation, and a system that allows sample cooling at the same time, so there is no damage to the sample. Up to three targets can be attached, making it excellent for multilayer film formation. In addition, the design is based on ergonomics, including ease of handling samples and tips, and an interlock function for safe use.

■Device configuration

・Sputter film formation room ・Deposition stage drive mechanism ・Sample cooling stage drive mechanism ・Sample base shutter mechanism ・Load lock room ・Sample transport mechanism ・Controller for vapor deposition source

  • Product

    Thin film production equipment Magnetron sputtering deposition equipment

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1 Models of Thin film production equipment Magnetron sputtering deposition equipment

Image Part Number Price (excluding tax) Sample transport mechanism Evaporation source control Base heating temperature Ultimate vacuum
Thin film production equipment Magnetron sputtering deposition equipment-Part Number-Magnetron sputtering deposition equipment

Magnetron sputtering deposition equipment

Available upon quote

Transfer rod method

Emission and sweep control

Base surface temperature Max500℃

≦1.0E^-7Pa

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About Company Handling This Product

Response Rate

100.0%


Response Time

22.5hrs

  • Japan

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