Thin film production equipment Magnetron sputtering deposition equipment
Kitano Seiki Co., Ltd.
About This Product
■Features
This equipment is a Brainer-type magnetron sputtering ultra-high vacuum thin film production equipment using a DC magnetron sputtering source. It has a sample holder rotation mechanism that enables uniform film formation, and a system that allows sample cooling at the same time, so there is no damage to the sample. Up to three targets can be attached, making it excellent for multilayer film formation.
In addition, the design is based on ergonomics, including ease of handling samples and tips, and an interlock function for safe use.
■Device configuration
・Sputter film formation room
・Deposition stage drive mechanism
・Sample cooling stage drive mechanism
・Sample base shutter mechanism
・Load lock room
・Sample transport mechanism
・Controller for vapor deposition source
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Product
Thin film production equipment Magnetron sputtering deposition equipment
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Handling Company
Kitano Seiki Co., Ltd.
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Categories
1 Models of Thin film production equipment Magnetron sputtering deposition equipment
| Product Image | Part Number | Price (excluding tax) | Base heating temperature | Evaporation source control | Sample transport mechanism | Ultimate vacuum |
|---|---|---|---|---|---|---|
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Magnetron sputtering deposition equipment |
Available upon quote | Base surface temperature Max500℃ | Emission and sweep control | Transfer rod method | ≦1.0E^-7Pa |
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About Company Handling This Product
- Japan