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  3. Vacuum Vapor Deposition Devices
  4. Organic vapor deposition cell KOD-Cell (Kitano Seiki Co., Ltd.)
Organic vapor deposition cell KOD-Cell-KOD-Cell
Organic vapor deposition cell KOD-Cell-Kitano Seiki Co., Ltd.

Organic vapor deposition cell KOD-Cell
Kitano Seiki Co., Ltd.

Kitano Seiki Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

22.5hours

Relatively Fast Response

About This Product

This product is a low-temperature cell (Organic Deposition Cell: KOD-Cell) that can operate stably at low temperatures for growing thin films of high vapor pressure materials (organic materials). KOD-Cell has excellent temperature response and temperature stability by adopting an indirect heating method.

■Features

・The crucible capacity is small at 1cc, allowing for a wide range of applications and easy use. - Carefully selected materials are used, and the simple structure makes maintenance easy. ・Uses sheath heater material to maintain uniform temperature ・Equipped with a shutter mechanism, so vapor deposition can be adjusted. - Extremely lightweight, making it easy to install and remove ・The connecting flange is a gasket type, but it can be customized freely. ・Organic materials can be removed by simply placing it in an ultrasonic cleaner.

■Applications

・Growth of thin films of high vapor pressure materials ・Growth of organic thin film ・Growth of metal thin films (for low temperature deposition)

  • Product

    Organic vapor deposition cell KOD-Cell

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1 Models of Organic vapor deposition cell KOD-Cell

Image Part Number Price (excluding tax) In-plane distribution Deposition rate Thermocouple Temperature stability Material efficiency Maximum stable operating temperature Connection flange Heating control temperature Cooling method Crucible material Crucible capacity Heater Shutter mechanism Overshoot value Distance between TSs
Organic vapor deposition cell KOD-Cell-Part Number-KOD-Cell

KOD-Cell

$ 3,120.00〜

Organic film: ±2.5%

0.01Å/s is easily possible (Inficon film thickness meter is recommended)

K type (C/A)

±0.2℃

With 0.2g of material, 50nm film can be deposited more than 5 times at a rate of 1Å/s

500℃

ICF-70FH

100℃~500℃

With water cooling jacket (SUS1/4” pipe)

Shapal, high density carbon, alumina, quartz glass, AlN

1cc

Sheath type

Manual type/Pneumatic type (optional)

0.2℃ or less

Recommended length from substrate to evaporation source is 250mm

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About Company Handling This Product

Kitano Seiki Co., Ltd.

Response Rate

100.0%

Response Time

22.5hrs

  • Japan

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Vacuum Vapor Deposition Devices　Kitano Seiki Co., Ltd.
Kitano Seiki Co., Ltd.

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