Organic vapor deposition cell KOD-Cell-KOD-Cell
Organic vapor deposition cell KOD-Cell-Kitano Seiki Co., Ltd.

Organic vapor deposition cell KOD-Cell
Kitano Seiki Co., Ltd.


About This Product

This product is a low-temperature cell (Organic Deposition Cell: KOD-Cell) that can operate stably at low temperatures for growing thin films of high vapor pressure materials (organic materials). KOD-Cell has excellent temperature response and temperature stability by adopting an indirect heating method. ■Features ・The crucible capacity is small at 1cc, allowing for a wide range of applications and easy use. - Carefully selected materials are used, and the simple structure makes maintenance easy. ・Uses sheath heater material to maintain uniform temperature ・Equipped with a shutter mechanism, so vapor deposition can be adjusted. - Extremely lightweight, making it easy to install and remove ・The connecting flange is a gasket type, but it can be customized freely. ・Organic materials can be removed by simply placing it in an ultrasonic cleaner. ■Applications ・Growth of thin films of high vapor pressure materials ・Growth of organic thin film ・Growth of metal thin films (for low temperature deposition)

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    Organic vapor deposition cell KOD-Cell

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1 Models of Organic vapor deposition cell KOD-Cell

Product Image Part Number Price (excluding tax) Connection flange Cooling method Crucible capacity Crucible material Deposition rate Distance between TSs Heater Heating control temperature In-plane distribution Material efficiency Maximum stable operating temperature Overshoot value Shutter mechanism Temperature stability Thermocouple
Organic vapor deposition cell KOD-Cell-Part Number-KOD-Cell

KOD-Cell

$ 3,120.00〜 ICF-70FH With water cooling jacket (SUS1/4” pipe) 1cc Shapal, high density carbon, alumina, quartz glass, AlN 0.01Å/s is easily possible (Inficon film thickness meter is recommended) Recommended length from substrate to evaporation source is 250mm Sheath type 100℃~500℃ Organic film: ±2.5% With 0.2g of material, 50nm film can be deposited more than 5 times at a rate of 1Å/s 500℃ 0.2℃ or less Manual type/Pneumatic type (optional) ±0.2℃ K type (C/A)

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