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History
Response Rate
100.0%
Response Time
23.6hours
Relatively Fast Response
Product
Organic EL prototype device manufacturing equipment Film deposition equipment for organic material development KVD-OLED Evo.ClusterHandling Company
Kitano Seiki Co., Ltd.Categories
| Image | Part Number | Price (excluding tax) | In-plane distribution (%) | Installation space for device only (mm) | Vapor deposition source (original) | Substrate heating during vapor deposition | Automatic deposition | Automatic transport | Automatic exhaust | Automatic vent | Film thickness resolution (Å/s) | Number of film thickness sensors installed (base) | Film thickness sensor cooling method | Vacuum exhaust system | Organic material codeposition | Deposition room (number of rooms) | Number of introduction room stockers (stages) | Board size (inch) | Pretreatment chamber (chamber) | Ultimate pressure (Pa) | Input power | Glove box connection |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
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KVD-OLED Evo.Cluster |
Available upon quote |
Organic film within ±3% at 50mm |
2,000×2,000 |
Organic: 8×2 |
Yes (optional) |
Standard equipment |
Standard equipment |
Standard equipment |
Standard equipment |
0.0057Å/s (using INFICON CYGNUS) |
Organic:8 |
Water cooling (can be controlled down to 0.01℃ using chiller) |
Film forming chamber: Cryopump |
Possible (Dope mixing ratio 0.1~30wt% at host 1Å/s using unique control method) |
Organic: 2 |
12 |
2 |
1 (plasma cleaning) |
Deposition room + other: 10^-6 units |
3φ200V200A |
Yes (optional) |
Reviews shown here are reviews of companies.
Reviews shown here are reviews of companies.
Response Rate
100.0%
Response Time
23.6hrs
