Organic EL prototype device manufacturing equipment Film deposition equipment for organic material development KVD-OLED Evo.Cluster
Kitano Seiki Co., Ltd.
About This Product
■Applications
・Organic EL material development
・Polymer material development
・Phosphorescent material development
・Development of organic thin film solar cells
・Organic electronic device development, etc.
■Features
・Mask and sample transportation is possible with 3-axis robot mechanism
・Equipped with a substrate holder vacuum sealing mechanism in the transfer room (optional)
・Co-evaporation of organic materials is possible (up to 4 elements)
・8 types of organic materials can be prepared in the same room
・Equipped with two organic deposition rooms, so 16 organic deposition sources can be installed.
・Equipped with water cooling jacket as standard to prevent contamination between organic materials and metal materials
・Substrate and mask can be exchanged individually in a vacuum environment in the deposition chamber
・Minimum gap between substrate and mask
・In-plane film thickness distribution flatness within ±5% due to substrate rotation mechanism
・Organic deposition cells have excellent directivity and less material contamination inside the deposition chamber.
・Each processing chamber has a special surface treatment to quickly reach the operating vacuum environment pressure.
・Can be connected to a glove box
・Plasma substrate cleaning is possible in the pre-processing room
・6 standard substrates and mask holders can be stocked in the introduction room.
・Automatic conveyance, automatic exhaust, and automatic deposition are possible with PLC control.
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Product
Organic EL prototype device manufacturing equipment Film deposition equipment for organic material development KVD-OLED Evo.Cluster
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Handling Company
Kitano Seiki Co., Ltd.
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Categories
1 Models of Organic EL prototype device manufacturing equipment Film deposition equipment for organic material development KVD-OLED Evo.Cluster
| Product Image | Part Number | Price (excluding tax) | Automatic deposition | Automatic exhaust | Automatic transport | Automatic vent | Board size (inch) | Deposition room (number of rooms) | Film thickness resolution (Å/s) | Film thickness sensor cooling method | Glove box connection | In-plane distribution (%) | Input power | Installation space for device only (mm) | Number of film thickness sensors installed (base) | Number of introduction room stockers (stages) | Organic material codeposition | Pretreatment chamber (chamber) | Substrate heating during vapor deposition | Ultimate pressure (Pa) | Vacuum exhaust system | Vapor deposition source (original) |
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KVD-OLED Evo.Cluster |
Available upon quote | Standard equipment | Standard equipment | Standard equipment | Standard equipment | 2 |
Organic: 2 Metal: 1 |
0.0057Å/s (using INFICON CYGNUS) | Water cooling (can be controlled down to 0.01℃ using chiller) | Yes (optional) |
Organic film within ±3% at 50mm Metal film within ±5% |
3φ200V200A | 2,000×2,000 |
Organic:8 Metal: 2 |
12 | Possible (Dope mixing ratio 0.1~30wt% at host 1Å/s using unique control method) | 1 (plasma cleaning) | Yes (optional) |
Deposition room + other: 10^-6 units Introduction room: 10^-5 units |
Film forming chamber: Cryopump Pretreatment chamber: turbo molecular pump Introduction chamber: turbo molecular pump Dry pump (roughing pump) |
Organic: 8×2 Metal: 5 |
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About Company Handling This Product
- Japan