Organic EL prototype device manufacturing equipment Film deposition equipment for organic material development KVD-OLED Evo.3
Kitano Seiki Co., Ltd.
About This Product
■Applications
・Organic EL material development
・Polymer material development
・Phosphorescent material development
・Development of organic thin film solar cells
・Organic electronic device development, etc.
■Features
・Equipped with water cooling jacket as standard to prevent contamination between organic materials and metal materials
・Substrate and mask can be exchanged individually in a vacuum environment in the deposition chamber
・Minimum gap between substrate and mask
・In-plane film thickness distribution flatness within ±5% due to substrate rotation mechanism
・Organic deposition cells have excellent directivity and less material contamination inside the deposition chamber.
・Each processing chamber has a special surface treatment to quickly reach the operating vacuum environment pressure.
・Can be connected to a glove box
・Standard 12 substrates and mask holders can be stocked in the introduction room.
・Automatic conveyance and automatic exhaust are possible with PLC control.
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Product
Organic EL prototype device manufacturing equipment Film deposition equipment for organic material development KVD-OLED Evo.3
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Handling Company
Kitano Seiki Co., Ltd.
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Categories
1 Models of Organic EL prototype device manufacturing equipment Film deposition equipment for organic material development KVD-OLED Evo.3
| Product Image | Part Number | Price (excluding tax) | Automatic exhaust | Board size (inch) | Deposition room (number of rooms) | Film thickness resolution (Å/s) | Film thickness sensor cooling method | Glove box connection | In-plane distribution (%) | Input power | Installation space for device only (mm) | Number of introduction room stockers (stages) | Organic material codeposition | Substrate heating during vapor deposition | Ultimate pressure (Pa) | Vacuum exhaust system | Vapor deposition source (original) |
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KVD-OLED Evo.3 |
Available upon quote | Yes (optional) | 2 |
Organic: 1 Organometallic common: 1 |
0.0057Å/s (using INFICON CYGNUS) | Water cooling (can be controlled down to 0.01℃ using chiller) | Yes (optional) |
Organic film within ±3% at 50mm Metal film within ±5% |
3φ200V150A | 3,900×1,200 | 4×3 (column) | Possible (Dope mixing ratio 0.1~30wt% at host 1Å/s using unique control method) | Yes (optional) |
Deposition room + other: 10^-6 units Introduction room: 10^-5 units |
Film forming chamber: Cryopump Introduction chamber: turbo molecular pump Dry pump (roughing pump) |
Organic:8+6 Metal: 3 yuan |
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About Company Handling This Product
- Japan