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  4. Thermal Microscope TM3 for measuring the thermal effusivity of thin films and microscopic areas (Bethel Co., Ltd.)
Thermal Microscope TM3 for measuring the thermal effusivity of thin films and microscopic areas-TM3
Thermal Microscope TM3 for measuring the thermal effusivity of thin films and microscopic areas-Bethel Co., Ltd.

Thermal Microscope TM3 for measuring the thermal effusivity of thin films and microscopic areas
Bethel Co., Ltd.

Bethel Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

196.4hours

About This Product

■Features

・Thermophysical property microscope is a device that measures thermal effusivity, which is one of the thermophysical property values. ・This is a device that makes it possible to measure the thermophysical properties of samples at points, lines, and planes. ・It is also possible to measure the distribution of thermophysical properties on the micron order, which was considered difficult with conventional thermophysical property measurement equipment. ・This is the world's first device that enables non-contact, high-resolution measurement of thermophysical properties. ・With a detection light spot diameter of 3 μm, it is possible to measure thermophysical properties in minute areas (point, line, and surface measurements) with high resolution. ・Measurement can be performed by changing the depth range, so it can measure everything from thin films and multilayer films to bulk materials. ・Samples on substrates can also be measured. ・Non-contact measurement using laser light. - Capable of detecting cracks, voids, and peeling under thin films.

■Measurement principle of thermophysical property microscope (overview)

A thin metal film is deposited on the sample and heated periodically using a heating laser. 1. The reflectance of metals has the property of changing depending on the surface temperature (thermal reluctance method), so by capturing the changes in the reflection intensity of the detection laser irradiated coaxially with the heating laser, we can measure the relative temperature changes on the surface. Measure. 2. Heat propagates from the metal thin film to the sample, causing a phase lag in the surface temperature response. This phase delay changes depending on the thermal characteristics of the sample. The thermal effusivity is determined by measuring the phase delay between this heating light and the detection light.

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    Thermal Microscope TM3 for measuring the thermal effusivity of thin films and microscopic areas

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1 Models of Thermal Microscope TM3 for measuring the thermal effusivity of thin films and microscopic areas

Image Part Number Price (excluding tax) Power box weight Power box external dimensions Power supply Sample Repeatability Measurement items Thin film to be measured Measurement mode Standard accessories Detection laser Detection light spot diameter Body weight Body external dimensions Heating laser Operating temperature range Stage travel distance 1 point measurement standard time Option
Thermal Microscope TM3 for measuring the thermal effusivity of thin films and microscopic areas-Part Number-TM3

TM3

Available upon quote

26.4kg

620 (W) × 480 (D) × 310 (H) mm

AC 100V 1.5kVA

1.Specimen holder 30mm x 30mm thickness 5mm
2. Plate sample: 30mm x 30mm or less, thickness 3mm or less
- Mirror polishing of the sample surface is required.
・Mo sputtering is required on the sample surface.

Thermal effusivity of Pyrex and silicone is less than ±10%

Thermal effusivity, (thermal diffusivity), (thermal conductivity)

Thickness: Several hundred nm to several tens of μm

Thermophysical property distribution measurement (1-dimensional/2-dimensional/1 point)

Sample holder, reference sample

Semiconductor laser wavelength: 658nm

Approximately 3μm

80.0kg

730 (W) × 620 (D) × 560 (H) mm

Semiconductor laser wavelength: 808nm

24℃±1℃ (according to the device's built-in temperature sensor)

・X-axis direction 20mm
・Y-axis direction 20mm
・Z-axis direction 10mm

10 seconds

Optical surface plate, air conditioner, air conditioning booth, sputtering equipment

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Bethel Co., Ltd.

Response Rate

100.0%

Response Time

196.4hrs

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