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Nanoscale infrared spectroscopy system for 300mm semiconductor wafer Park NX-IR R300-NX-IR R300
Nanoscale infrared spectroscopy system for 300mm semiconductor wafer Park NX-IR R300-Park Systems Japan Co., Ltd.

Nanoscale infrared spectroscopy system for 300mm semiconductor wafer Park NX-IR R300
Park Systems Japan Co., Ltd.

Park Systems Japan Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

26.4hours

Relatively Fast Response


About This Product

Park NX-IR R300 is a nanoscale infrared spectroscopy system compatible with semiconductor wafers up to 300mm. In addition to chemical property information, it provides unprecedented high nano-resolution for semiconductor research such as mechanical property and shape measurements, failure analysis, and defect evaluation. The Park NX-IR R300 integrates state-of-the-art nanoscale infrared spectroscopy and atomic force microscopy, incorporating Molecular Vista's optically induced force microscopy (PiFM) module into the Park NX20 300mm AFM platform. The Park NX-IR R300 is a system that combines spectroscopy and atomic force microscopy to identify chemicals with a spatial resolution of 10 nm. By using non-contact technology, we have achieved damage-free spectroscopic scanning and the industry's highest level of spatial resolution. Furthermore, it is a microscopy system that can image materials with 3D topography and nanometer lateral resolution with sub-Angstrom height accuracy.

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    Nanoscale infrared spectroscopy system for 300mm semiconductor wafer Park NX-IR R300

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1 Models of Nanoscale infrared spectroscopy system for 300mm semiconductor wafer Park NX-IR R300

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Nanoscale infrared spectroscopy system for 300mm semiconductor wafer Park NX-IR R300-Part Number-NX-IR R300

NX-IR R300

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Response Rate

100.0%


Response Time

26.4hrs

  • Japan

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