Park NX-Hybrid WLI, the world's first hybrid semiconductor measurement device that combines atomic force microscope and white light interference technology-NX-Hybrid WLI
Park NX-Hybrid WLI, the world's first hybrid semiconductor measurement device that combines atomic force microscope and white light interference technology-Park Systems Japan Co., Ltd.

Park NX-Hybrid WLI, the world's first hybrid semiconductor measurement device that combines atomic force microscope and white light interference technology
Park Systems Japan Co., Ltd.


About This Product

Park NX-Hybrid WLI is the world's first AFM system with a built-in white light interferometer for measurement, quality assurance, front-end process control, and back-end advanced package management in semiconductor device R&D/production sites. is. With sub-nano resolution and ultra-high precision, it is possible to zoom in to the nanoscale region, enabling high-throughput measurements over an extremely wide range. ■Fusion of two technologies ideal for semiconductor measurement ・White light interferometer (WLI) White light interferometry is an optical technology that can measure large areas at high speed, making it possible to perform measurements with unprecedented high throughput. ・Atomic force microscope (AFM) Atomic force microscopy is a scanning probe technology that can measure even transparent materials with the highest resolution on the nanoscale. ■WLI applications that require high resolution and precision that far exceed the capabilities of conventional WLI ・Advanced CMP measurement and monitoring ・Advanced packaging ・Hot spot and defect detection on die reticle ・Wafer level measurement ■AFM applications requiring wider measurement range and higher throughput ・Inline, wafer measurement ・Long range for CMP characteristic evaluation, profiling ・Sub-angstrom surface roughness control ・Wafer inspection and analysis ■Features ・Supports WLI mode and PSI mode (PSI mode supports electric filter changer) ・Available objective lens magnification: 2.5X, 10X, 20X, 50X, 100X ・Two objective lenses can be switched automatically using the electric linear lens changer. - The height of the sample surface at each pixel can be calculated from the change in light intensity due to interference while scanning the height of the Mirau objective lens. -White light interferometry (WLI) and phase shift interferometry (PSI) are commonly used techniques for surface characterization.

  • Product

    Park NX-Hybrid WLI, the world's first hybrid semiconductor measurement device that combines atomic force microscope and white light interference technology

Share this product


150+ people viewing

Last viewed: 5 hours ago


Free
Since our quotes are free, feel free to use our service.

No Phone Number Required
You won’t have to worry about receiving unnecessary calls.

1 Models of Park NX-Hybrid WLI, the world's first hybrid semiconductor measurement device that combines atomic force microscope and white light interference technology

Product Image Part Number Price (excluding tax)
Park NX-Hybrid WLI, the world's first hybrid semiconductor measurement device that combines atomic force microscope and white light interference technology-Part Number-NX-Hybrid WLI

NX-Hybrid WLI

Available upon quote

Customers who viewed this product also viewed

Other products of Park Systems Japan Co., Ltd.


View more products of Park Systems Japan Co., Ltd.

About Company Handling This Product

This is the version of our website addressed to speakers of English in the United States. If you are a resident of another country, please select the appropriate version of Metoree for your country in the drop-down menu.

Copyright © 2024 Metoree