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  4. EUV mask repair by AFM Park NX-Mask (Park Systems Japan Co., Ltd.)
EUV mask repair by AFM Park NX-Mask-NX-Mask
EUV mask repair by AFM Park NX-Mask-Park Systems Japan Co., Ltd.

EUV mask repair by AFM Park NX-Mask
Park Systems Japan Co., Ltd.

Park Systems Japan Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

26.4hours

Relatively Fast Response

About This Product

Park NX-Mask is a new generation photomask repair system that supports the miniaturization of devices and the increasing complexity of photomasks. Park NX-Mask is an innovative tool for high-end EUV mask repair that incorporates cutting-edge atomic force microscopy technology. Park NX-Mask provides an all-in-one solution from automatic defect inspection to defect repair and repair verification, achieving high throughput with unprecedented repair effectiveness.

■Repair defects using a highly safe and superior method

During the process of light reflection from an EUV light source, particles such as tin (Sn) can reach the mask and reduce the light reflectance. Park NX-Mask uses proven nanomechanical AFM technology to Find and remove particles and complex pattern defects in the safest way possible. Unlike traditional photomask repair systems, it performs repairs without damaging or contaminating the mask surface.

■Safety

・No electron beam charging ・No use of chemicals ・No vacuum required

■Features

・Nanometer resolution and high precision repair ・Complete everything from survey scanning to repair and verification in one system ・Reasonable pricing

■Non-contact AFM technology that enables defect identification and post-repair verification

Park NX-Mask uses proprietary non-contact AFM technology, the safest scanning method, to perform survey scans to locate defects. Survey scans provide information about the size and exact location of defects, as well as information about each particle or defect. After repair, Park NX-Mask performs post-repair verification using non-contact AFM technology and outputs other measurement data such as nanoscale 3D topography and surface roughness.

  • Product

    EUV mask repair by AFM Park NX-Mask

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1 Models of EUV mask repair by AFM Park NX-Mask

Image Part Number Price (excluding tax)
EUV mask repair by AFM Park NX-Mask-Part Number-NX-Mask

NX-Mask

Available upon quote

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About Company Handling This Product

Park Systems Japan Co., Ltd.

Response Rate

100.0%

Response Time

26.4hrs

  • Japan

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