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  4. Automated nanometer measurement equipment for wafer measurement and analysis Park NX20 300mm (Park Systems Japan Co., Ltd.)
Automated nanometer measurement equipment for wafer measurement and analysis Park NX20 300mm-NX20 300mm
Automated nanometer measurement equipment for wafer measurement and analysis Park NX20 300mm-Park Systems Japan Co., Ltd.

Automated nanometer measurement equipment for wafer measurement and analysis Park NX20 300mm
Park Systems Japan Co., Ltd.

Park Systems Japan Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

26.4hours

Relatively Fast Response

About This Product

The Park NX20 300mm is the industry's first atomic force microscope (AFM) for large samples that fully automates measurements of 300mm x 300mm. Designed for research in failure analysis and quality control, it enables more efficient inspection of entire 300mm wafers without tedious sample exchanges. Keep the actual noise level below 0.5 Å or 0.3 Å RMS. The proven AFM performance and one-click automatic measurement feature eliminates the need for sample-by-sample parameter adjustments, making the operating process more efficient and user-friendly. The unique SmartScan measurement interface allows you to easily achieve stable and highly reproducible continuous automatic multi-point measurement over the entire 300mm x 300mm area.

■Specially manufactured for large wafer research

The NX20 300mm has been designed to optimally measure large samples. Through low-noise AFM measurements, the entire area of ​​a 300mm wafer can be analyzed. This opens up entirely new possibilities for automated measurement, allowing users to perform tasks more simply, quickly, and with high precision.

■NX20 with reliable performance equipped with 300mm sample stage

With an enhanced platform that supports a 300mm automated XY stage, the NX20 300mm goes the extra mile to allow users to study large samples with great precision and ease.

■Park SmartScan™ makes accurate measurements easy

The built-in SmartScan™ operating software makes it one of the easiest AFMs to operate on the market. The intuitive yet extremely powerful interface allows even untrained users to quickly scan large samples without guidance.

■Optimization for a wide range of application fields

The NX20 300mm is equipped with automated AFM metrology for advanced measurement and analysis capabilities at the nanoscale, including thermal and nanomechanical property imaging, defect review, and electrical and magnetic failure analysis. With its ability to measure roughness, height and depth, AFM is ideal for working with a wide range of large samples.

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    Automated nanometer measurement equipment for wafer measurement and analysis Park NX20 300mm

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1 Models of Automated nanometer measurement equipment for wafer measurement and analysis Park NX20 300mm

Image Part Number Price (excluding tax) Field of view Focus stage drive range Sample weight Sample size Z stage driving distance Z Scanner Height (Height) Noise Level Z scanner scan range XY stage drive range XY scanner scan range CCD pixel
Automated nanometer measurement equipment for wafer measurement and analysis Park NX20 300mm-Part Number-NX20 300mm

NX20 300mm

Available upon quote

840µm x 630µm (when using 10x objective lens)

8mm (electric)

<500g

100,150,200,300 mm wafers, small samples Magnetic sample holder, up to 20 mm thickness

25mm (electric)

30pm, 0.5kHz bandwidth/rms (typical)

15μm (30μm as option)

300mmx300mm (electric)

100μm×100μm

5M pixels

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About Company Handling This Product

Park Systems Japan Co., Ltd.

Response Rate

100.0%

Response Time

26.4hrs

  • Japan

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