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  4. Wafer dry cleaning equipment WaferClean 2200 (Bruker Corporation)
Wafer dry cleaning equipment WaferClean 2200-WaferClean 2200
Wafer dry cleaning equipment WaferClean 2200-Bruker Corporation

Wafer dry cleaning equipment WaferClean 2200
Bruker Corporation

Bruker Corporation's Response Status

Response Rate

100.0%

Response Time

30.7hours

Relatively Fast Response

About This Product

■CO2 dry cleaning equipment for wafers

・Particle removal by CO2 precision dry cleaning for wafers ・By adopting an optimized unique nozzle, it is possible to control the flow rate, particle size, and density of CO₂. ・Supports particles in fragile parts such as MEMS and residues such as rapid ear ・No modification of wafer surface due to chemical-free process ・Manual wafer loading equipment for research and development is also available (VersaClean 1400)

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    Wafer dry cleaning equipment WaferClean 2200

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1 Models of Wafer dry cleaning equipment WaferClean 2200

Image Part Number Price (excluding tax)
Wafer dry cleaning equipment WaferClean 2200-Part Number-WaferClean 2200

WaferClean 2200

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About Company Handling This Product

Bruker Corporation

Response Rate

100.0%

Response Time

30.7hrs

Company Overview

Bruker, founded in 1960 and based in Billerica, Massachusetts, is a manufacturer and distributor of scientific...

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Semiconductor Cleaning Equipment
Semiconductor Cleaning Equipment　Bruker Corporation
Bruker Corporation

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