Excellent homogeneity & maximum flexibility Ionfab 300 IBE
Oxford Instruments Ltd.
About This Product
■Summary
It has maximum flexibility with excellent homogeneity and is suitable for a wide range of application areas. Our systems have flexible hardware options including atmospheric charging, single board vacuum prechambers, and cassette exchange schemes. System specifications are carefully tailored to your application to deliver fast and reproducible results.
■Features
・Multiple mode function
・Can be clustered with other plasma etching and plasma deposition tools
・Single wafer vacuum chamber or cluster wafer handling
・Dual beam arrangement
・Very low thin film surface roughness
- Unrivaled batch homogeneity and process reproducibility
・Accurate endpoint detection – SIMS, luminescence analysis
■Product features
・High quality thin film - very little contamination
・High throughput with small footprint - low operating costs
- Patented high-speed substrate holder (up to 500 RPM) with white optical monitor design - allows for highly accurate, in-situ optical thin film control
・Flexible placement - advanced research applications
・Flexible wafer handling capabilities - Handling capabilities - atmospheric charging, single wafer vacuum pre-chamber, cassette exchange robot operation
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Product
Excellent homogeneity & maximum flexibility Ionfab 300 IBE
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Handling Company
Oxford Instruments Ltd.
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Categories
1 Models of Excellent homogeneity & maximum flexibility Ionfab 300 IBE
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Ionfab 300 IBE |
Available upon quote |
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About Company Handling This Product
- Japan