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  4. Excellent homogeneity & maximum flexibility Ionfab 300 IBE (Oxford Instruments Ltd.)
Excellent homogeneity & maximum flexibility Ionfab 300 IBE-Ionfab 300 IBE
Excellent homogeneity & maximum flexibility Ionfab 300 IBE-Oxford Instruments Ltd.

Excellent homogeneity & maximum flexibility Ionfab 300 IBE
Oxford Instruments Ltd.

Oxford Instruments Ltd.'s Response Status

Response Rate

100.0%

Response Time

26.3hours

Relatively Fast Response

About This Product

■Summary

It has maximum flexibility with excellent homogeneity and is suitable for a wide range of application areas. Our systems have flexible hardware options including atmospheric charging, single board vacuum prechambers, and cassette exchange schemes. System specifications are carefully tailored to your application to deliver fast and reproducible results.

■Features

・Multiple mode function ・Can be clustered with other plasma etching and plasma deposition tools ・Single wafer vacuum chamber or cluster wafer handling ・Dual beam arrangement ・Very low thin film surface roughness - Unrivaled batch homogeneity and process reproducibility ・Accurate endpoint detection – SIMS, luminescence analysis

■Product features

・High quality thin film - very little contamination ・High throughput with small footprint - low operating costs - Patented high-speed substrate holder (up to 500 RPM) with white optical monitor design - allows for highly accurate, in-situ optical thin film control ・Flexible placement - advanced research applications ・Flexible wafer handling capabilities - Handling capabilities - atmospheric charging, single wafer vacuum pre-chamber, cassette exchange robot operation

  • Product

    Excellent homogeneity & maximum flexibility Ionfab 300 IBE

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1 Models of Excellent homogeneity & maximum flexibility Ionfab 300 IBE

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Excellent homogeneity & maximum flexibility Ionfab 300 IBE-Part Number-Ionfab 300 IBE

Ionfab 300 IBE

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About Company Handling This Product

Oxford Instruments Ltd.

Response Rate

100.0%

Response Time

26.3hrs

  • Japan

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