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  3. Ion Implanters
  4. Ion beam technology enables maximum system utilization with a single tool Ionfab 300 IBD (Oxford Instruments Ltd.)
Ion beam technology enables maximum system utilization with a single tool Ionfab 300 IBD-Ionfab 300 IBD
Ion beam technology enables maximum system utilization with a single tool Ionfab 300 IBD-Oxford Instruments Ltd.

Ion beam technology enables maximum system utilization with a single tool Ionfab 300 IBD
Oxford Instruments Ltd.

About This Product

■Summary

It is chosen because it provides thin film deposition with high quality, high density and smooth surfaces. Ion beam technology can provide the greatest versatility for etching and deposition with maximum system utilization in a single tool. Our systems have flexible hardware options including atmospheric charging, single board vacuum prechambers, and cassette exchange schemes. System specifications are carefully tailored to your application to deliver fast and reproducible results.

■Features

・Multiple mode function ・Can be clustered with other plasma etching and plasma deposition tools ・Single wafer vacuum chamber or cluster wafer handling ・Dual beam arrangement ・Very low film surface roughness - Unrivaled batch homogeneity and process reproducibility ・Accurate endpoint detection – SIMS, luminescence analysis

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    Ion beam technology enables maximum system utilization with a single tool Ionfab 300 IBD

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1 Models of Ion beam technology enables maximum system utilization with a single tool Ionfab 300 IBD

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Ion beam technology enables maximum system utilization with a single tool Ionfab 300 IBD-Part Number-Ionfab 300 IBD

Ionfab 300 IBD

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Oxford Instruments Ltd.

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