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MOCVD equipment horizontal reactor SH2003Handling Company
Epiquest Co., Ltd.Categories
| Image | Part Number | Price (excluding tax) | Wafer surface | Gas control box | Cylinder cabinet | Process exhaust | Reactor shape | Control device interlock function | Control device Backup power supply | Control device Safety device | Control device operation panel | Control device error display | Control device Automatic growth system | Substrate (wafer) size x number of wafers | Substrate heating | Substrate rotation mechanism | Loading room Board storage mechanism (3 sheets in stock) | Loading chamber Exhaust system | Maximum heating temperature | Transport mechanism |
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SH2003 |
Available upon quote |
Face up |
6 organometallic systems, 3 hydride systems, 2 carrier gas systems, 2 vent gas systems, dummy line, purge line |
47L (10L) 4 containers (3 gas, 1 nitrogen) |
Rotary pump (dry pump available as an option) |
Horizontal stainless steel reactor |
Standard equipment |
Standard equipment |
Standard equipment |
Standard equipment |
Standard equipment |
Standard equipment |
Φ2 inch x 3 pieces |
Resistance heating method |
0~30rpm |
Standard equipment |
Turbo molecular pump + rotary pump |
1,300℃ (control thermocouple value) |
Transfer rod type or rail type |
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Reviews shown here are reviews of companies.
