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Horizontal CNT graphene synthesis device MPCVD-Graphene-MPCVD-Graphene
Horizontal CNT graphene synthesis device MPCVD-Graphene-Microphase Co., Ltd.

Horizontal CNT graphene synthesis device MPCVD-Graphene
Microphase Co., Ltd.

Microphase Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

126.2hours


About This Product

Rapid cooling of the substrate is said to be one of the important factors in growing graphene films on catalyst substrates (Ni, Cu, etc.) using the CVD method using hydrocarbon gases (CH4 and C2H2). This device is equipped with a mechanism that allows only the heating section to be slid while leaving the furnace tube intact. This sliding mechanism allows the hot zone of the furnace to be quickly removed from the sample location, allowing rapid cooling of the sample. Additionally, by installing an optional high-vacuum exhaust system, single-layer graphene films with larger areas can be easily formed.

■Purpose

This is a tubular furnace (50mmφ) type thermal CVD equipment for synthesizing graphene films.

■Features

・Equipped with a furnace slide movement mechanism, allowing rapid heating/cooling of samples ・Three mass flow gas flow control systems enable accurate gas control ・Compact and sturdy housing design, easy to install on tabletop laboratory benches, etc.

■Options

・Automatic slide function driven by motor can also be added. ・By adding a turbo exhaust pump, even higher quality graphene can be deposited. ・Introducing a thermocouple sensor into the furnace to directly monitor sample temperature

  • Product

    Horizontal CNT graphene synthesis device MPCVD-Graphene

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1 Models of Horizontal CNT graphene synthesis device MPCVD-Graphene

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MPCVD-Graphene

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About Company Handling This Product

Response Rate

100.0%


Response Time

126.2hrs

Company Overview

Microphase Co. Ltd., established in 1999 and headquartered in Ibaraki, Japan, is a manufacturer of nanotechnol...

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