Spectroscopic measurement Photonic band diagram microscope FA・CEED
Tokyo Instruments, Inc
About This Product
■Photonic band diagram microscope FA・CEED
Joint development project. Automatically measure band diagrams of various photonic structures quickly and easily.
■Product overview
The ``Photonic Band Diagram Microscope FA・CEED'' is a device that makes it possible to quickly and easily measure the entire band diagram of various structures such as photonic crystals and metamaterials.
In conventional evaluation methods, it was necessary to set up an optical system in a form suitable for each sample, and it was common for observations to take time, such as adjusting the optical system, measuring time, and evaluating time. This device solves these problems and makes it possible to easily and quickly measure the physical properties of various photonic structures.
Photonic structures (microstructures smaller than the wavelength of light arranged with a certain periodicity) make it possible to manipulate light in a variety of ways by utilizing the interaction between light and matter within the structure. Typical examples include photonic crystals, topological photonic crystals, and metamaterials, which are realized by microfabrication of semiconductors using nanoprocess technology.
One of the important indicators for determining the optical properties of such structures is the photonic band diagram. This device can measure this photonic band diagram at high speed, and can predict various optical phenomena observed in various photonic structures, such as slow light effect, polarization-dependent unidirectional propagation, and negative refractive index. It will be possible.
By using this device, the characteristics of various photonic structures can be clarified and used as indicators for exploring fundamental physical properties. Furthermore, in the market, it will become easier to design optical devices that employ various photonic structures, leading to the expansion of related markets and the development of new research areas using these devices.
This device is used for the research project "Development of new properties for topological state creation based on artificial graphene" in the CREST "Creation of materials and devices with innovative functions based on topological materials science" area of the Japan Science and Technology Agency's Strategic Creative Research Promotion Project. This product was jointly developed with Assistant Professor Tomohiro Amemiya of Tokyo Institute of Technology.
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Product
Spectroscopic measurement Photonic band diagram microscope FA・CEED
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Handling Company
Tokyo Instruments, Inc
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Categories
1 Models of Spectroscopic measurement Photonic band diagram microscope FA・CEED
| Product Image | Part Number | Price (excluding tax) | Installation stand set Surface plate size | Objective lens lifting stage complete set Objective lens lifting stage | Sample stage set Sample scanning XY axis stage | Sample stage set Sample scanning Z-axis stage | Spatial frequency filtering 4F optical system set-1 | Spatial frequency filtering 4F optical system set-2 | Spatial frequency filtering 4F optical system set-3 | Spatial frequency filtering 4F optical system set-4 | Spatial frequency filtering 4F optical system set-5 | Spatial frequency filtering 4F optical system set-6 | Spatial frequency filtering 4F optical system set-7 | Spatial frequency filtering 4F optical system set-8 |
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FA・CEED |
Available upon quote | 350×600×100mm |
・Stroke ±10 mm or less ・Resolution full/half: 0.5/0.25 μm or less ・When dividing ratio is 1/20: 0.025 μm |
・Stroke ±10 mm ・Resolution full/half: 0.5/0.25 μm or less ・When dividing ratio is 1/20: 0.025 μm |
・Stroke ±4 mm or more ・Resolution full/half: 0.5/0.25 μm or less |
Objective lens ・Observation field of view: max. 200 x 200 μm ・Magnification: About 60X ・N.A.: About 0.9 |
Variable range Equipped with variable aperture of φ0.8~φ12 |
Illumination light source wavelength range ・300~2,500 nm ・Output: 5.5 mW or more (350 to 1,800 nm range, when using 200 μm core diameter fiber) ・Fiber core diameter: φ50 μm ・Optical connector: FC |
Visible observation camera CMOS color camera (more than 5 million pixels, sample surface field of view more than 200 × 200 μm) |
LCD variable wavelength filter wavelength range ・850~1,800 nm ・Bandwidth FWHM: 6 nm or less ・Effective diameter: approximately φ20 mm |
LCD variable wavelength filter wavelength range ・Response time: 50~150ms ・Maximum incident illuminance: 500 mW/cm2 or more ・Allowable angle: ±7.5° or less |
Infrared camera pixel count ・80,000 pixels 320×256 ・Effective imaging area: 9.6 x 7.68 mm ・Pixel size: 30×30 μm |
Infrared camera pixel count ・Frame rate: 90 fps ・A/D resolution: 14 bit ・Interface: USB2.0 |
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- Japan