Product
Spectroscopic measurement Spectrophotometer for optical element evaluation and quality control PHOTON RT seriesHandling Company
Tokyo Instruments, IncCategories
Product Image | Part Number | Price (excluding tax) | Measurement component Sample size | Measurement component synchronous control | Measurement components Sample stage | Measuring components independent control | Optical system specifications Contrast luminous flux | Optical system specifications Incident angle range | Optical system specifications Measurement light size | Optical system specifications Measurement parameters | Optical system specifications Measurement wavelength range | Optical system specifications Photodetector rotation interval | Optical system specifications Sample table rotation interval | Optical system specifications Signal processing | Optical system specifications Spectrometer layout | Optical system specifications Spectrometer optical elements | Optical system specifications Wavelength feed interval | Optical system specifications Wavelength feed rate nm/min | Spectrometer specifications Bandpass | Spectrometer specifications Baseline stability | Spectrometer specifications Beam divergence angle | Spectrometer specifications Equipped with polarizer | Spectrometer specifications Light source | Spectrometer specifications Photometric accuracy-1 | Spectrometer specifications Photometric accuracy-2 | Spectrometer specifications Photometric accuracy-3 | Spectrometer specifications Photometry repeatability -1 | Spectrometer specifications Photometry repeatability -2 | Spectrometer specifications Stray light | Spectrometer specifications Wavelength accuracy | Spectrometer specifications Wavelength feed repeatability | User interface, dimensions Connections |
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PHOTON RT 0420 Ultra |
Available upon quote |
12 × 10 mm or more (incidence angle of 10 degrees or less) 12 × 25 mm or more (incident angle 10~75 degrees) Max Ø120mm with closed lit – |
Synchronous control of sample table and detector unit according to measurement content | 12 × 10 mm or more (transmission, reflection measurement) | Independent control of sample table and detector section | Double beam method |
Transmittance measurement: 0~75 degree Reflectance measurement: 8~75 degrees |
6x2mm | Transmittance, reflectance, optical density, absorbance |
185~1,700nm, 185~3,500nm, 185~4,900nm, 380~1,700nm, 380~3,500nm, 380~5,200nm 185~5,200nm |
0.01° | 0.01° | Averaging, smoothing, integral value calculation | Zerny turner type | Mirror Al+SiO2/MgF2 coating | 0.5~100nm | 3,000 nm/min. (measured at 5 nm intervals) |
0.6 nm@185~990 nm 1.2 nm@990~2,450 nm 2.4 nm@2,450~5,200 nm |
0.1%/hour @ UV-VIS (after 30 minutes warm-up operation) | ± 1 |
380~2,200 nm, 220~2,200 nm, 220~4,900 nm, 380~5,200 nm S, P, S+P+ (S+P) /2, Random, user defined S:P ratio |
Halogen lamp, deuterium lamp, IR lamp Hg-Ar lamp (for wavelength calibration) |
± 0.003Abs (1 Abs) ((using NIST SRM930) | ± 0.003Abs (0.33 Abs) ((using NIST SRM1930) | ± 0.006Abs (2 Abs) ((using NIST SRM1930) |
± 0.0004Abs (1 Abs) ((using NIST SRM930) ± 0.0001Abs (0.33 Abs) ((using NIST SRM1930) |
± 0.005Abs (2 Abs) ((using NIST SRM1930) 0.1 second integration, maximum deviation when measuring 10 times |
< 0.2% (@532 nm) | ±0.24 nm or less | ±0.12 nm or less | USB 2.0 |