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  4. Carrier cleaning machine OKH-MR-series (OHMIYA IND.CO.,LTD)
Carrier cleaning machine OKH-MR-series-OKH-MR
Carrier cleaning machine OKH-MR-series-OHMIYA IND.CO.,LTD

Carrier cleaning machine OKH-MR-series
OHMIYA IND.CO.,LTD

About This Product

The carrier cleaning machine is a cleaning and drying device for wafer carriers and carrier boxes. Cleaning with a high-pressure water shower and drying with centrifugal force and clean air (or N₂).

■Cleaning effect improved

By spraying pressurized gas and atomized pure water at the same time, high-pressure droplets are sprayed intermittently and continuously, achieving a cleaning effect greater than that of high-pressure spray.

■Drying efficiency increased

The centrifugal force generated by high-speed rotation scatters water droplets on the surface of the workpiece, and at the same time it dries it with clean air through a filter. (N₂ specification also available) Furthermore, water droplets that cannot be blown away by centrifugal force are blown away with pressurized air using a special nozzle to follow areas that are difficult to dry, increasing drying efficiency.

■Eco specifications considering running costs

Because the spray particles are fine, the flow rate of pure water is also 1/3 compared to conventional methods. (Compared to our company) Eco-design that takes into consideration running costs as well as equipment price.

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    Carrier cleaning machine OKH-MR-series

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1 Models of Carrier cleaning machine OKH-MR-series

Image Part Number Price (excluding tax) Driving air Power supply Equipment dimensions Pure water Material Drain Exhaust port Compatible work Number of revolutions Dry air Recipe Tact Timer settings
Carrier cleaning machine OKH-MR-series-Part Number-OKH-MR

OKH-MR

Available upon quote

Pressure: 0.5MPa or more Consumption: 30L/min (ANR)

AC200V±10%50/60Hz30A

For 6inch carrier W950×D1,340×H1,200 (H2,020 with lid open) (mm)

Pressure: 0.2Mpa or more Pure water consumption: 12L/min

[Body exterior] PVCTSP-333 (Ivory) [Rotor] SUS304 electrolytic polishing treatment

VP401 location (from chamber)

VP501 location (from chamber) (displacement 8M3/min)

Carrier x 2 pieces Carrier BOX x 2 pieces

10~600min^-16 speed setting possible

Clean air pressure: 0.3MPa or more Consumption: 450L/min (ANR)

10 types

15min/times *Varies depending on carrier shape

0~999sec

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About Company Handling This Product

OHMIYA IND.CO.,LTD

Company Overview

OHMIYA IND.CO.LTD, established in 1975 and headquartered in Hiroshima, Japan, is a manufacturer and distributo...

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  • Japan

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Semiconductor Cleaning Equipment
Semiconductor Cleaning Equipment　OHMIYA IND.CO.,LTD
OHMIYA IND.CO.,LTD

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