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Heat resistance can be used in an environment between 315 ° C to -240 ° C. It also has excellent drug resistance and can withstand all fluid gas, molten alkaline metal, and polymerized monomers at high temperature and high pressure. It can be used in a clean room or in a semiconductor manufacturing device due to non -dust.
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Porous PTFE JavaraHandling Company
Aritosukai Co., Ltd.Image | Price (excluding tax) |
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