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Oxford Instruments Ltd.'s Plasma-Enhanced CVD

Oxford Instruments Ltd.

6 products found

Oxford Instruments Ltd.

ICPCVD Process Module PlasmaPro 100 ICPCVD

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Last viewed: 3 hours ago

The ICPCVD (Inductively Coupled Plasma) process module is designed to produce high-quality thin films at low temperatures and uses a high-density r...

Oxford Instruments Ltd.

Achieving high film formation characteristics of nanomaterials PlasmaPro 100 Nano CVD

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Last viewed: 4 hours ago

Chemical vapor deposition (CVD) and plasma enhanced CVD (PECVD) are suitable tools for the growth of 1D and 2D nanomaterials and the formation of h...

Oxford Instruments Ltd.

Plasma CVD system PlasmaPro 100 PECVD

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Last viewed: 1 day ago

The PlasmaPro 100 PECVD system is a specially designed system for producing high-quality thin films with excellent uniformity and controlled film p...

Oxford Instruments Ltd.

Compact and versatile etch and deposition solution PlasmaPro 80 PECVD

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Last viewed: 1 day ago

The PlasmaPro 80 is a compact, space-saving system that provides versatile etch and deposition solutions in an easy-to-use, open-load format. This ...

Oxford Instruments Ltd.

PlasmaPro 80 RIE provides versatile etch and deposition solutions with an easy-to-use atmospheric charging method

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Last viewed: 23 hours ago

■Summary PlasmaPro 80 Reactive Ion Etching (RIE) is a compact, space-saving system that provides a variety of etch and deposition solutions with an...

Oxford Instruments Ltd.

A flexible solution for plasma-enhanced chemical vapor deposition processes PlasmaPro 800 PECVD

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Last viewed: 5 hours ago

The PlasmaPro 800 provides a flexible solution for plasma-enhanced chemical vapor deposition (PECVD) processes for large wafer batches and 300mm wa...


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