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  3. Chemical Vapor Deposition (CVD) Systems
  4. PECVD COPRA Linear Sources for large substrates (Sputtering Components Japan Co., Ltd.)
PECVD COPRA Linear Sources for large substrates-COPRA Linear Sources
PECVD COPRA Linear Sources for large substrates-Sputtering Components Japan Co., Ltd.

PECVD COPRA Linear Sources for large substrates
Sputtering Components Japan Co., Ltd.

About This Product

■Features

・Less substrate damage because ion energy does not increase in proportion to power level ・The applicable vacuum range is wide from 1x10-4 to 1x10-1 mbar, making it easy to integrate with sputtering equipment. ・Can be applied to large substrates with a substrate width of 3m class, so it is widely used in architecture (Low-E), FPD, and solar cells. ・High-speed film formation up to the 10nm/sec level is possible

■Film formation example

・SiO2 ・Si3N4 ・Al2O3 ・DLC (a-D:H) ・a-Si, u-Si

■Application example

・Optical film: Optical multilayer film, sputtering and electron gun deposition assist ・Solar cells: anti-reflection film, protective film, absorption layer, barrier film ・Display: OLED organic layer sealing film, transparent electrode film, transparent protective film ・Hard disk: TMR barrier, carbon protective film ・Semiconductor: Chemical etching, physical etching ・Large substrate: functional oxide film, barrier film ・Hard coat and decorative film: DLC, oxide film, nitride film ・Packaging: Roll-to-roll barrier film on film substrate ・Even if high power is applied, the ion energy does not increase, so damage to the substrate can be minimized.

  • Product

    PECVD COPRA Linear Sources for large substrates

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1 Models of PECVD COPRA Linear Sources for large substrates

Image Part Number Price (excluding tax)
PECVD COPRA Linear Sources for large substrates-Part Number-COPRA Linear Sources

COPRA Linear Sources

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Sputtering Components Japan Co., Ltd.

  • Japan

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