PECVD COPRA Linear Sources for large substrates
Sputtering Components Japan Co., Ltd.
About This Product
■Features
・Less substrate damage because ion energy does not increase in proportion to power level
・The applicable vacuum range is wide from 1x10-4 to 1x10-1 mbar, making it easy to integrate with sputtering equipment.
・Can be applied to large substrates with a substrate width of 3m class, so it is widely used in architecture (Low-E), FPD, and solar cells.
・High-speed film formation up to the 10nm/sec level is possible
■Film formation example
・SiO2
・Si3N4
・Al2O3
・DLC (a-D:H)
・a-Si, u-Si
■Application example
・Optical film: Optical multilayer film, sputtering and electron gun deposition assist
・Solar cells: anti-reflection film, protective film, absorption layer, barrier film
・Display: OLED organic layer sealing film, transparent electrode film, transparent protective film
・Hard disk: TMR barrier, carbon protective film
・Semiconductor: Chemical etching, physical etching
・Large substrate: functional oxide film, barrier film
・Hard coat and decorative film: DLC, oxide film, nitride film
・Packaging: Roll-to-roll barrier film on film substrate
・Even if high power is applied, the ion energy does not increase, so damage to the substrate can be minimized.
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Product
PECVD COPRA Linear Sources for large substrates
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Handling Company
Sputtering Components Japan Co., Ltd.
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Categories
1 Models of PECVD COPRA Linear Sources for large substrates
| Product Image | Part Number | Price (excluding tax) |
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COPRA Linear Sources |
Available upon quote |
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