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  2. ICP plasma source COPRA (Sputtering Components Japan Co., Ltd.)
ICP plasma source COPRA-RS Copra
ICP plasma source COPRA-LS Copra (1E-1mbar)
ICP plasma source COPRA-LS Copra (1E-2mbar)
ICP plasma source COPRA-DN Copra (1E-2mbar)
ICP plasma source COPRA-LS Copra (1E-3mbar)
ICP plasma source COPRA-DN Copra (1E-3mbar)
ICP plasma source COPRA-IS Copra
ICP plasma source COPRA-Sputtering Components Japan Co., Ltd.

ICP plasma source COPRA
Sputtering Components Japan Co., Ltd.

About This Product

This is an ICP type plasma source manufactured by CCR in Germany. Almost all equipment manufacturers in Europe use it as their plasma source for PVD assist or PECVD.

■Features

・Many deliveries of large plasma sources over 1m using CCR's unique technology ・Can be adjusted to various vacuum levels for evaporation, sputtering, and PECVD using CCR's unique technology ・Because it is an ICP method, the risk of chamber contamination is low and the maintenance load is low. ・Because it is an ICP method, there is little change in ion energy due to input power, and there is little damage to the board.

■Summary 1: Oxidation and nitridation assist during sputtering

Effect: Reactive coating at a deposition rate comparable to metal mode

■Summary 2: PECVD in sputter vacuum area

Effect: PECVD can be incorporated into sputtering equipment

■Summary 3: Etching before PVD film formation

Effect: Improved adhesion

■Summary 4: Ar assist during PVD film formation

Effect: Increased density of deposited layer Note 1: Rental of PVD assist evaluation unit is negotiable. Note 2: PECVD demo deposition consultation available

■Plasma generation method

ICP (Inductively Coupled Plasma)

  • Product

    ICP plasma source COPRA

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7 Models of ICP plasma source COPRA

Click on the part number for more information about each product

Image Part Number Price (excluding tax) Vacuum degree (mbar) Center of motion area Process
ICP plasma source COPRA-Part Number-RS Copra

RS Copra

Available upon quote

1.00E-01

1E1Pa

PECVD

ICP plasma source COPRA-Part Number-LS Copra (1E-1mbar)

LS Copra (1E-1mbar)

Available upon quote

1.00E-01

1E1Pa

PECVD

ICP plasma source COPRA-Part Number-LS Copra (1E-2mbar)

LS Copra (1E-2mbar)

Available upon quote

1.00E-02

1Pa

Spatter
PECVD

ICP plasma source COPRA-Part Number-DN Copra (1E-2mbar)

DN Copra (1E-2mbar)

Available upon quote

1.00E-02

1Pa

Spatter
PECVD

ICP plasma source COPRA-Part Number-LS Copra (1E-3mbar)

LS Copra (1E-3mbar)

Available upon quote

1.00E-03

1E-1Pa

Spatter
PECVD

ICP plasma source COPRA-Part Number-DN Copra (1E-3mbar)

DN Copra (1E-3mbar)

Available upon quote

1.00E-03

1E-1Pa

Spatter
PECVD

ICP plasma source COPRA-Part Number-IS Copra

IS Copra

Available upon quote

1.00E-04

1E-2Pa

E beam
Vapor deposition

Click on the part number for more information about each product

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About Company Handling This Product

Sputtering Components Japan Co., Ltd.

  • Japan

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