ICP plasma source COPRA-LS Copra (1E-1mbar)

ICP plasma source COPRA-LS Copra (1E-2mbar)

ICP plasma source COPRA-DN Copra (1E-2mbar)

ICP plasma source COPRA-LS Copra (1E-3mbar)

ICP plasma source COPRA-DN Copra (1E-3mbar)

ICP plasma source COPRA
Sputtering Components Japan Co., Ltd.

Sputtering Components Japan Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

9.6hours

Fast Response

About This Product

This is an ICP type plasma source manufactured by CCR in Germany. Almost all equipment manufacturers in Europe use it as their plasma source for PVD assist or PECVD.

■Features・Many deliveries of large plasma sources over 1m using CCR's unique technology
・Can be adjusted to various vacuum levels for evaporation, sputtering, and PECVD using CCR's unique technology
・Because it is an ICP method, the risk of chamber contamination is low and the maintenance load is low.
・Because it is an ICP method, there is little change in ion energy due to input power, and there is little damage to the board.

■Summary 1: Oxidation and nitridation assist during sputteringEffect: Reactive coating at a deposition rate comparable to metal mode

■Summary 2: PECVD in sputter vacuum areaEffect: PECVD can be incorporated into sputtering equipment

■Summary 3: Etching before PVD film formationEffect: Improved adhesion

■Summary 4: Ar assist during PVD film formationEffect: Increased density of deposited layer

Note 1: Rental of PVD assist evaluation unit is negotiable.
Note 2: PECVD demo deposition consultation available

■Plasma generation methodICP (Inductively Coupled Plasma)

Model
There are 7 models for this product.

Product
ICP plasma source COPRA

Handling Company
Sputtering Components Japan Co., Ltd.

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7 Models of ICP plasma source COPRA

Click on the part number for more information about each product

Part Number	Price (excluding tax)	Vacuum degree (mbar)	Center of motion area	Process
RS Copra	Available upon quote	1.00E-01	1E1Pa	PECVD
LS Copra (1E-1mbar)	Available upon quote	1.00E-01	1E1Pa	PECVD
LS Copra (1E-2mbar)	Available upon quote	1.00E-02	1Pa	Spatter PECVD
DN Copra (1E-2mbar)	Available upon quote	1.00E-02	1Pa	Spatter PECVD
LS Copra (1E-3mbar)	Available upon quote	1.00E-03	1E-1Pa	Spatter PECVD
DN Copra (1E-3mbar)	Available upon quote	1.00E-03	1E-1Pa	Spatter PECVD
IS Copra	Available upon quote	1.00E-04	1E-2Pa	E beam Vapor deposition

Click on the part number for more information about each product

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About Company Handling This Product

Sputtering Components Japan Co., Ltd.

Response Rate

100.0%

Response Time

9.6hrs

Japan

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ICP plasma source COPRA Sputtering Components Japan Co., Ltd.

Sputtering Components Japan Co., Ltd.'s Response Status

About This Product

■Features

■Summary 1: Oxidation and nitridation assist during sputtering

■Summary 2: PECVD in sputter vacuum area

■Summary 3: Etching before PVD film formation

■Summary 4: Ar assist during PVD film formation

■Plasma generation method

7 Models of ICP plasma source COPRA

RS Copra

LS Copra (1E-1mbar)

LS Copra (1E-2mbar)

DN Copra (1E-2mbar)

LS Copra (1E-3mbar)

DN Copra (1E-3mbar)

IS Copra

Other products of Sputtering Components Japan Co., Ltd.

About Company Handling This Product

ICP plasma source COPRA
Sputtering Components Japan Co., Ltd.