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ICP plasma source COPRAHandling Company
Sputtering Components Japan Co., Ltd.Click on the part number for more information about each product
Image | Part Number | Price (excluding tax) | Vacuum degree (mbar) | Center of motion area | Process |
---|---|---|---|---|---|
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RS Copra |
Available upon quote |
1.00E-01 |
1E1Pa |
PECVD |
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LS Copra (1E-1mbar) |
Available upon quote |
1.00E-01 |
1E1Pa |
PECVD |
![]() |
LS Copra (1E-2mbar) |
Available upon quote |
1.00E-02 |
1Pa |
Spatter |
![]() |
DN Copra (1E-2mbar) |
Available upon quote |
1.00E-02 |
1Pa |
Spatter |
![]() |
LS Copra (1E-3mbar) |
Available upon quote |
1.00E-03 |
1E-1Pa |
Spatter |
![]() |
DN Copra (1E-3mbar) |
Available upon quote |
1.00E-03 |
1E-1Pa |
Spatter |
![]() |
IS Copra |
Available upon quote |
1.00E-04 |
1E-2Pa |
E beam |
Click on the part number for more information about each product
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