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Target High purity cylindrical Cu (copper) sputtering target-High purity cylindrical Cu (copper) monolithic sputtering target
Target High purity cylindrical Cu (copper) sputtering target-Sputtering Components Japan Co., Ltd.

Target High purity cylindrical Cu (copper) sputtering target
Sputtering Components Japan Co., Ltd.


About This Product

■Features

・We manufacture cylindrical Cu (copper) targets with a diameter of up to 163mm (Note 1) using monolithic (extrusion molding). Compared to monolithic Cu with a diameter of 153mm (Note 2), it is possible to continuously discharge approximately 1.55 times the volume of Cu (copper). ・We can provide high purity Cu (copper) with purity exceeding 99.95%. ・We provide OEM to major Japanese target manufacturers. ・Since it is made in China, it can be provided at a competitive price compared to Cu made in the United States, Europe, and Japan.

■Note 1

Target area thickness equivalent to 15mm. (When BT diameter is 133mm)

■Note 2

The target area thickness is equivalent to 10mm. (When BT diameter is 133mm)

■Summary

Fuzhou Yinrich Metallurgical Materials Co., Ltd is a sputtering target manufacturer established in 2001 in Fuzhou, Fujian Province, China. We offer a wide range of products, from metal sputtering targets to ceramic sputtering targets molded from nano-grade powder. The same factory also performs bonding backed by advanced technology. We can provide any shape such as cylinder, flat plate, or disk. Main production equipment

■Thermal spraying machine

10 units

■Cold spray machine

2 units

■Pulling furnace for single crystal or polycrystalline silicon using the Czochralski method (CZ method)

20 units

■Bonding machine

8 units

■CNC processing machine

15 units

  • Product

    Target High purity cylindrical Cu (copper) sputtering target

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1 Models of Target High purity cylindrical Cu (copper) sputtering target

Image Part Number Price (excluding tax)
Target High purity cylindrical Cu (copper) sputtering target-Part Number-High purity cylindrical Cu (copper) monolithic sputtering target

High purity cylindrical Cu (copper) monolithic sputtering target

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