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  2. Target High purity cylindrical Si (silicon) single crystal sputtering target (Sputtering Components Japan Co., Ltd.)
Target High purity cylindrical Si (silicon) single crystal sputtering target-High purity cylindrical Si (silicon) single crystal sputtering target
Target High purity cylindrical Si (silicon) single crystal sputtering target-Sputtering Components Japan Co., Ltd.

Target High purity cylindrical Si (silicon) single crystal sputtering target
Sputtering Components Japan Co., Ltd.

Sputtering Components Japan Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

9.6hours

Fast Response

About This Product

■Features

・Cylindrical single-crystal Si (silicon) sputtering targets are manufactured using the Czochralski method (CZ method). ・We can provide high purity Si (silicon) with purity exceeding 99.99%. ・We provide OEM to major Japanese target manufacturers. ・Since it is made in China, we can offer it at a competitive price compared to Si sputtering targets made in the United States, Europe, and Japan. ・Polycrystalline silicon sputtering targets are also available. ・We can also provide thermal sprayed SiAl sputtering targets and Boron doped Si sputtering targets.

■Summary

Fuzhou Yinrich Metallurgical Materials Co., Ltd is a sputtering target manufacturer established in 2001 in Fuzhou, Fujian Province, China. We offer a wide range of products, from metal sputtering targets to ceramic sputtering targets molded from nano-grade powder. The same factory also performs bonding backed by advanced technology. We can provide any shape such as cylinder, flat plate, or disk. Main production equipment

■Thermal spraying machine

10 units

■Cold spray machine

2 units

■Pulling furnace for single crystal or polycrystalline silicon using the Czochralski method (CZ method)

20 units

■Bonding machine

8 units

■CNC processing machine

15 units

  • Product

    Target High purity cylindrical Si (silicon) single crystal sputtering target

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1 Models of Target High purity cylindrical Si (silicon) single crystal sputtering target

Image Part Number Price (excluding tax)
Target High purity cylindrical Si (silicon) single crystal sputtering target-Part Number-High purity cylindrical Si (silicon) single crystal sputtering target

High purity cylindrical Si (silicon) single crystal sputtering target

Available upon quote

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About Company Handling This Product

Sputtering Components Japan Co., Ltd.

Response Rate

100.0%

Response Time

9.6hrs

  • Japan

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