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Plasma simulation using Particle-in-Cell method (PIC method) Particle-PLUS-Particle-PLUS
Plasma simulation using Particle-in-Cell method (PIC method) Particle-PLUS-Wavefront Co., Ltd.

Plasma simulation using Particle-in-Cell method (PIC method) Particle-PLUS
Wavefront Co., Ltd.


About This Product

Particle-PLUS is a simulation software excellent for numerical analysis of non-equilibrium plasma. We are particularly good at analyzing plasma phenomena in dilute gases (under low pressure) and near walls. To date, our system has been introduced to many companies and universities both domestically and internationally, and we have received many favorable comments from everyone. This product is software developed independently by Wavefront.

■What you can do with Particle-PLUS

Particle-PLUS analyzes plasma behavior in processes such as magnetron sputtering (DC or radio frequency), plasma CVD, plasma etching, ion plating, electron beam, and electrophoresis, and analyzes electron distribution, ion distribution, potential distribution, and current. You can calculate distributions, energy distributions, etc. In addition to plasma calculations, it also has calculation functions for magnetic field strength for magnet placement, film formation rate on substrates, solid temperature, etc.

■Complete service content

The Particle-PLUS development team will be close to everyone in the manufacturing industry and will do our best to support manufacturing. We provide services such as reliable support in response to concerns, software usage classes, and custom development to add functions based on customer requests. In addition to purchasing software, we also accept contract analysis services.

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    Plasma simulation using Particle-in-Cell method (PIC method) Particle-PLUS

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