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SOI wafer for optical communication
Micro Semiconductor Research Co., Ltd.


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■Summary

We manufacture thin film SOI wafers for applications such as optical waveguides for optical communications. The buried oxide film is 3 to 5 μm thick, and the thin active layer for optical waveguides is 100 to 500 nm thick. Data communications are increasing at an accelerating rate, and in order to process data at high speeds, miniaturization of semiconductors increases the possibility that electricity will heat up and circuits will short out. We provide SOI wafers for optical waveguides as substrates for next-generation optical semiconductors.By replacing the electricity that carries data with light, light has no heat and can process data faster than electrical signals.

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    SOI wafer for optical communication

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SOI wafer for optical communication

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