All Categories

History

  1. Metoree
  2. Semiconductor Manufacturing
  3. Chemical Vapor Deposition (CVD) Systems
  4. CVD equipment Rotating CVD equipment for C coating on Si negative electrode materials MPCVD-Powder (Microphase Co., Ltd.)
CVD equipment Rotating CVD equipment for C coating on Si negative electrode materials MPCVD-Powder-MPCVD-Powder
CVD equipment Rotating CVD equipment for C coating on Si negative electrode materials MPCVD-Powder-Microphase Co., Ltd.

CVD equipment Rotating CVD equipment for C coating on Si negative electrode materials MPCVD-Powder
Microphase Co., Ltd.

Microphase Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

126.2hours

About This Product

For carbon coating on powder surfaces/various heat treatments, etc.

■Purpose

This is a rotary tube furnace CVD device for CVD coating a carbon film on the surface of Si or graphite negative electrode powder samples.

■Features

・This is a CVD device that enables CVD processing by rotating the quartz furnace tube with a motor and stirring the powder sample. ・The rotating mechanism can operate in both normal pressure mode and reduced pressure mode, achieving even and uniform CVD processing and heat treatment. - As an optional feature, a pulsed gas control unit can be added to efficiently exchange fresh gas between narrow particles, resulting in higher uniformity. ・Ideal for carbon coating on lithium ion battery negative electrode materials and carbon coating on ceramic powder surfaces ・Other functions follow MPCVD-50

  • Product

    CVD equipment Rotating CVD equipment for C coating on Si negative electrode materials MPCVD-Powder

Share this product


40+ people viewing

Last viewed: 1 hour ago

Free
Get started with our free quotation service - no cost, no obligation.

No Phone Required
We respect your privacy. You can receive quotes without sharing your phone number.

1 Models of CVD equipment Rotating CVD equipment for C coating on Si negative electrode materials MPCVD-Powder

Image Part Number Price (excluding tax) Tubular furnace applicable tube outer diameter Tube furnace temperature control Tubular furnace regular operating temperature Tubular furnace external dimensions Tubular furnace breaker capacity Vacuum gauge Furnace tube material Furnace tube size Exhaust pump external dimensions Exhaust pump Gas control introduced gas type Gas control external dimensions (box) Gas control
CVD equipment Rotating CVD equipment for C coating on Si negative electrode materials MPCVD-Powder-Part Number-MPCVD-Powder

MPCVD-Powder

Available upon quote

~50mmφ

1-zone programmable temperature controller

400~1,000℃

W550mm×H300mm×D450mm

AC100V 20A single phase 50/60Hz

Bourdon tube vacuum gauge

Quartz

OD50mm×ID45mm×L800mm

W156mm×H200mm×D300mm

Rotary pump

Carrier gas: N2 or Ar
Reducing gas: H2
Hydrocarbon gas: C2H2 or C2H4 or CH4

W250mm×H310mm×D450mm

Mass flow controller

Customers who viewed this product also viewed

Reviews shown here are reviews of companies.

Semiconductor manufacturing equipment High performance single wafer atmospheric pressure CVD (APCVD) equipment (A200V)-M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High performance single wafer atmospheric pressure CVD (APCVD) equipment (A200V)

M.WATANABE & CO.,LTD.

50+ people viewing

Last viewed: 15 hours ago

Response time: 60.53 hours

Chemical Vapor Deposition (CVD) Systems

2 models listed

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX800V)-M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX800V)

M.WATANABE & CO.,LTD.

50+ people viewing

Last viewed: 3 hours ago

Response time: 60.53 hours

Chemical Vapor Deposition (CVD) Systems

2 models listed

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)-M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment High productivity continuous atmospheric pressure CVD (APCVD) equipment (AMAX1200)

M.WATANABE & CO.,LTD.

60+ people viewing

Last viewed: 1 hour ago

Response time: 60.53 hours

Chemical Vapor Deposition (CVD) Systems

2 models listed

MP-CVD equipment for diamond synthesis DCVD-301B/601B-Arios Co., Ltd.

MP-CVD equipment for diamond synthesis DCVD-301B/601B

Arios Co., Ltd.

50+ people viewing

Last viewed: 2 hours ago

Response time: 0.88 hours

Chemical Vapor Deposition (CVD) Systems

3 models listed

CVD equipment General purpose CVD equipment MPCVD-50-Microphase Co., Ltd.

CVD equipment General purpose CVD equipment MPCVD-50

Microphase Co., Ltd.

50+ people viewing

Last viewed: 49 minutes ago

Response time: 126.17 hours

Chemical Vapor Deposition (CVD) Systems
Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)-M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Atmospheric pressure CVD (APCVD) equipment for small-scale production and development (D501)

M.WATANABE & CO.,LTD.

70+ people viewing

Last viewed: 9 hours ago

Response time: 60.53 hours

Chemical Vapor Deposition (CVD) Systems

2 models listed

HF-CVD equipment for diamond synthesis HFCVD series-Arios Co., Ltd.

HF-CVD equipment for diamond synthesis HFCVD series

Arios Co., Ltd.

40+ people viewing

Last viewed: 1 hour ago

Response time: 0.88 hours

Chemical Vapor Deposition (CVD) Systems

2 models listed

Semiconductor manufacturing equipment Continuous normal pressure CVD equipment for mass production of solar cells (AMAX1000S)-M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Continuous normal pressure CVD equipment for mass production of solar cells (AMAX1000S)

M.WATANABE & CO.,LTD.

40+ people viewing

Last viewed: 2 hours ago

Response time: 60.53 hours

Chemical Vapor Deposition (CVD) Systems

2 models listed

CVD equipment Slide type long tube CVD equipment MPCVD-Slide-Microphase Co., Ltd.

CVD equipment Slide type long tube CVD equipment MPCVD-Slide

Microphase Co., Ltd.

40+ people viewing

Last viewed: 13 hours ago

Response time: 126.17 hours

Chemical Vapor Deposition (CVD) Systems
CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma-Microphase Co., Ltd.

CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma

Microphase Co., Ltd.

50+ people viewing

Last viewed: 2 hours ago

Response time: 126.17 hours

Chemical Vapor Deposition (CVD) Systems

2 models listed

Semiconductor manufacturing equipment Low-temperature film deposition Compatible with flexible substrates Glass substrate film deposition equipment-M.WATANABE & CO.,LTD.

Semiconductor manufacturing equipment Low-temperature film deposition Compatible with flexible substrates Glass substrate film deposition equipment

M.WATANABE & CO.,LTD.

40+ people viewing

Last viewed: 8 minutes ago

Response time: 60.53 hours

Chemical Vapor Deposition (CVD) Systems

2 models listed

Plasma CVD experimental equipment PCVD-R100-Arios Co., Ltd.

Plasma CVD experimental equipment PCVD-R100

Arios Co., Ltd.

30+ people viewing

Last viewed: 1 hour ago

Response time: 0.88 hours

Chemical Vapor Deposition (CVD) Systems

3 models listed

See More Chemical Vapor Deposition (CVD) Systems Products

Other products of Microphase Co., Ltd.

Reviews shown here are reviews of companies.

CVD equipment General purpose CVD equipment MPCVD-50-Microphase Co., Ltd.

CVD equipment General purpose CVD equipment MPCVD-50

Microphase Co., Ltd.

50+ people viewing

Last viewed: 49 minutes ago

Response time: 126.17 hours

Chemical Vapor Deposition (CVD) Systems
CVD equipment Slide type long tube CVD equipment MPCVD-Slide-Microphase Co., Ltd.

CVD equipment Slide type long tube CVD equipment MPCVD-Slide

Microphase Co., Ltd.

40+ people viewing

Last viewed: 13 hours ago

Response time: 126.17 hours

Chemical Vapor Deposition (CVD) Systems
CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma-Microphase Co., Ltd.

CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma

Microphase Co., Ltd.

50+ people viewing

Last viewed: 2 hours ago

Response time: 126.17 hours

Plasma-Enhanced CVD

2 models listed

CVD equipment Laser assisted CVD equipment MPCVD-Laser-Microphase Co., Ltd.

CVD equipment Laser assisted CVD equipment MPCVD-Laser

Microphase Co., Ltd.

50+ people viewing

Last viewed: 33 minutes ago

Response time: 126.17 hours

Chemical Vapor Deposition (CVD) Systems

View more products of Microphase Co., Ltd.

About Company Handling This Product

Microphase Co., Ltd.

Response Rate

100.0%

Response Time

126.2hrs

Company Overview

Microphase Co. Ltd., established in 1999 and headquartered in Ibaraki, Japan, is a manufacturer of nanotechnol...

See More

  • Japan

Related search keywords

Chemical Vapor Deposition (CVD) Systems
Chemical Vapor Deposition (CVD) Systems　Microphase Co., Ltd.
Microphase Co., Ltd.

This is the version of our website addressed to speakers of English in the United States. If you are a resident of another country, please select the appropriate version of Metoree for your country in the drop-down menu.

Copyright © 2024 Metoree