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  3. Chemical Vapor Deposition (CVD) Systems
  4. CVD equipment General purpose CVD equipment MPCVD-50 (Microphase Co., Ltd.)
CVD equipment General purpose CVD equipment MPCVD-50-MPCVD-50
CVD equipment General purpose CVD equipment MPCVD-50-Microphase Co., Ltd.

CVD equipment General purpose CVD equipment MPCVD-50
Microphase Co., Ltd.

Microphase Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

126.2hours

About This Product

For CNT synthesis, carbon film formation, nanoceramic film formation, nitriding, chalcogenide film formation, etc.

■Purpose

This is a general-purpose tubular furnace type thermal CVD equipment for synthesizing CNT, depositing carbon on powder samples, and depositing various CVD films. By adding an introduction unit for ammonia, various CVD reaction gases, sublimation solid precursors, and liquid precursors, it can also be applied to nitriding treatments and film formation of chalcogenide (molybdenum disulfide, MoS2, etc.) layered materials.

■Features

-Equipped with a liquid fuel (ethanol) introduction system, allowing use in locations where hydrocarbon gas cannot be installed. ・Three mass flow gas flow rate control systems enable accurate gas control. -Equipped with a vacuum exhaust system as standard, and can be used as a vacuum furnace, atmosphere furnace, etc. - Compact and sturdy housing design, easy to install on tabletop laboratory benches, etc. - Highly scalable and easy to handle any type of processing.

  • Product

    CVD equipment General purpose CVD equipment MPCVD-50

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1 Models of CVD equipment General purpose CVD equipment MPCVD-50

Image Part Number Price (excluding tax) Tubular furnace electrical capacity Tube furnace temperature control Tubular furnace regular operating temperature Tubular furnace external dimensions Internal dimensions of tube furnace Vacuum gauge Furnace tube material Furnace tube size Exhaust pump external dimensions Exhaust pump Introduced gas type External dimensions Gas control
CVD equipment General purpose CVD equipment MPCVD-50-Part Number-MPCVD-50

MPCVD-50

Available upon quote

700W

1-zone programmable temperature controller

400~1,000℃

W300mm×H200mm×D186mm

60mmφ×L260mm

Bourdon tube vacuum gauge

Quartz

OD50mm×ID46mm×L900mm

W156mm×H200mm×D300mm

Rotary pump

Carrier gas: N2 or Ar
Reducing gas: H2
Hydrocarbon gas: C2H2 or C2H4 or CH4

W1,100mm×H1,000mm×D500mm

Mass flow controller

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About Company Handling This Product

Microphase Co., Ltd.

Response Rate

100.0%

Response Time

126.2hrs

Company Overview

Microphase Co. Ltd., established in 1999 and headquartered in Ibaraki, Japan, is a manufacturer of nanotechnol...

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  • Japan

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Chemical Vapor Deposition (CVD) Systems
Chemical Vapor Deposition (CVD) Systems　Microphase Co., Ltd.
Microphase Co., Ltd.

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