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  4. Plasma cleaner G1000 (HiSOL,Inc.)
Plasma cleaner G1000-G1000
Plasma cleaner G1000-HiSOL,Inc.

Plasma cleaner G1000
HiSOL,Inc.

HiSOL,Inc.'s Response Status

Response Rate

100.0%

Response Time

40.5hours

About This Product

G1000 is a system that uses the etching effect of gas plasma to clean the surface of objects to be cleaned in a low-pressure environment. By selecting the gas to be used according to the application, not only organic but also inorganic contamination can be reliably removed. This system is ideal for improving bonding strength by cleaning the bonding surfaces of HIC substrates and lead frames, and improving wettability by surface modification (hydrophilicization).

■Application

・Etching of organic materials (resist, etc.) ・Removal of contamination and flux ・Cleaning the wire bonding surface - improving bonding strength ・Improving surface hydrophilicity – die attach/mold pretreatment ・Surface tension control etc…

■Equipment features

・Parallel plate type chamber irradiates plasma evenly onto the surface to be cleaned ・Select from 5 plasma modes with different strengths, such as electron-free plasma and active plasma, depending on the cleaning target ・12 types of cleaning conditions can be stored in memory, and recipes can be easily set and operated using the touch panel on the front of the device. ・With 40kHz LF plasma power supply, plasma irradiation is more efficient than high frequency (13.56MHz) (less thermal stress on workpiece) ・3 types of gas can be selected, gas mixing and flow rate can be controlled by the CPU with the optional mass flow controller

■Chamber design

There are 14 slits in the chamber of YES's plasma cleaner for setting trays. A total of 12 trays with holes are included and function as electrodes and workpiece holders. There are three types of trays: active tray (+), ground tray (-), and floating tray insulated from the chamber. Plasma is generated between the active tray and the ground tray.

■5 types of plasma modes

The following five types of plasma modes can be used depending on the cleaning target. ・Downstream electron-free plasma (ideal for workpieces prone to electrostatic damage) ・Downstream electron-free ion trap (strong mode for workpieces prone to electrostatic damage) ・Active plasma (HIC substrate, lead frame, etc.) ・RIE mode plasma (strong cleaning effect) ・Active ion trap (the most powerful plasma effect)

  • Product

    Plasma cleaner G1000

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1 Models of Plasma cleaner G1000

Image Part Number Price (excluding tax) Power supply Weight Setting resolution Power consumption Body size (approx.) W×D×H Operating temperature Number of recipes Mass flow controller Process gas system Process gas type Process gas consumption Plasma irradiation time Chamber size (approx.) W×D×H Cleanliness RF plasma power N2 gas consumption
Plasma cleaner G1000-Part Number-G1000

G1000

Available upon quote

Single phase 200 – 250V, 20A, 50/60Hz

159kg

1 second

Average 640W, maximum 1,000W

60×71×113cm

20–100℃

12 recipes

Options up to 3

3 systems (optional 1 system can be added)

Oxygen, Ar, N2, Hydrogen (7% mixed gas) / Consultation required: CF4, SF6

20 – 50 SCCM

0 – 1,200 seconds

45×45×30cm

Class 10

40kHz, 0 – 1,000W

Up to 1.7 SCFM

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About Company Handling This Product

HiSOL,Inc.

Response Rate

100.0%

Response Time

40.5hrs

Company Overview

Hisol Inc., established in 1967 as Kan Electronics, is a manufacturer based in Tokyo, Japan, producing machine...

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  • Japan

Related search keywords

Plasma Cleaners
Plasma Cleaners　HiSOL,Inc.
HiSOL,Inc.

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